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University of Illinois at Urbana-Champaign

Selective area growth of gallium nitride y plasma-assisted molecular beam epitaxy or wide and ultra-wide bandgap power device applications

Abstract

dc:description

Submission published under a 24 month embargo labeled 'U of I Access', the embargo will last until 2026-12-01

Degree

thesis:*
Name thesis:degree_name
Ph.D.
Level thesis:degree_level
Dissertation
Discipline thesis:degree_discipline
Electrical & Computer Engr
Grantor
University of Illinois at Urbana-Champaign
Year dc:date
2024

Author and committee

dc:creator, dc:contributor.*
Author dc:creator
  • Landi, Matthew M
Contributors dc:contributor
  • Kim, Kyekyoon
  • Bayram, Can
  • Dallesasse, John
  • Lee, Minjoo
  • Sardela, Mauro

Subjects

dc:subject × 8

Rights

dc:rights
Statement dc:rights
  • Copyright 2024 Matthew Landi
Language dc:language
en, eng

Identifiers

dc:identifier.*
Handle dc:identifier
https://hdl.handle.net/2142/127360
OAI identifier oai:identifier
oai:www.ideals.illinois.edu:2142/127360

Chain of custody

source
Harvested from
University of Illinois - Urbana-Champaign
Base URL
www.ideals.illinois.edu/oai-pmh
Last updated
2026-07-22
Source record
OAI-PMH GetRecord
citation

Landi, Matthew M. Selective area growth of gallium nitride y plasma-assisted molecular beam epitaxy or wide and ultra-wide bandgap power device applications. Dissertation thesis, University of Illinois at Urbana-Champaign, 2024. https://hdl.handle.net/2142/127360