Atmospheric pressure plasma chemical vapor deposition of silicon dioxide for improved adhesion and water intrusion resistance for lightweight manufacturing

This work aims to demonstrate the barrier coating, and adhesion promoting properties of silica-based coatings deposited using an atmospheric pressure plasma torch (APPT). This is achieved by applying an industrial grade adhesive to silica thin films deposited, on the surfaces to be joined, using atmospheric pressure plasma chemical vapor deposition (APP-CVD), to make single joint lap shear samples of different metal combinations commonly found in lightweight manufacturing such as aluminum and magnesium as well as steel. To deposit these thin films, two separate silicon based organic precursors, hexamethyldisiloxane (HMDSO), and tetraethylorthosilicate (TEOS), are used. Samples are bonded using DuPont Betamate 1486 adhesive, and the lap shear results for these films are compared to the lap shear results of a chemically cleaned control using the same adhesive. The APPT uses a microwave power supply and gas mixtures of N2 and Ar. The adhesion of the films are tested using lap shear, and elevated temperature water soaks are conducted on the joints as well to simulate environmental exposure. Lap shear results from treated samples have max shear stresses that are 25%-115% higher compared to control samples depending on material. After exposure to water soak the max shear strength of the joints decreased by less than 15%, which demonstrates the films capabilities as a water barrier. Film morphology is examined using scanning electron microscopy (SEM), and the film’s composition and approximate thickness are obtained using Rutherford backscattering spectroscopy (RBS).

Name thesis:degree_name

M.S.

Level thesis:degree_level

Thesis

Discipline thesis:degree_discipline

Nuclear, Plasma, Radiolgc Engr

Grantor

University of Illinois at Urbana-Champaign

Year dc:date

2023

Author dc:creator

• Jeckell, Zachary Jon

Contributors dc:contributor

• Ruzic, David N
• Sankaran, Mohan

• Atmospheric Pressure Plasma
• Chemical Vapor Deposition
• Silicon Oxide
• Oxygen Diffusion Barrier
• Optical Emission Spectroscopy
• Lightweight Manufacturing

Statement dc:rights

• Copyright 2023 Zachary Jeckell

Language dc:language

en, eng

Handle dc:identifier

https://hdl.handle.net/2142/122063

OAI record oai:identifier

https://www.ideals.illinois.edu/oai-pmh?verb=GetRecord&metadataPrefix=etdms&identifier=oai%3Awww.ideals.illinois.edu%3A2142%2F122063