{"id":{"repo_id":"uiuc","oai_identifier":"oai:www.ideals.illinois.edu:2142/122063"},"canonical_url":"https://search.dev.ndltd.org/etd/uiuc/oai:www.ideals.illinois.edu:2142/122063","repository":{"repo_id":"uiuc","name":"University of Illinois - Urbana-Champaign","base_url":"https://www.ideals.illinois.edu/oai-pmh"},"display":{"title":"Atmospheric pressure plasma chemical vapor deposition of silicon dioxide for improved adhesion and water intrusion resistance for lightweight manufacturing","abstract":"Submission original under an indefinite embargo labeled 'Open Access'. The submission was exported from vireo on 2024-03-01 without embargo terms","abstract_html":"Submission original under an indefinite embargo labeled 'Open Access'. The submission was exported from vireo on 2024-03-01 without embargo terms","abstract_has_math":false,"creators":["Jeckell, Zachary Jon"],"institution":"University of Illinois at Urbana-Champaign","degree_name":"M.S.","degree_level":"Thesis","degree_discipline":"Nuclear, Plasma, Radiolgc Engr","degree_department":null,"school":null,"contributors":["Ruzic, David N","Sankaran, Mohan"],"advisors":[],"committee_chairs":[],"committee_members":[],"year":2023,"date_issued":"2023-12","date_published":"2023-12","updated_at":"2026-07-22T22:25:00Z","subjects":["Atmospheric Pressure Plasma","Chemical Vapor Deposition","Silicon Oxide","Oxygen Diffusion Barrier","Optical Emission Spectroscopy","Lightweight Manufacturing"],"languages":["en","eng"],"rights":["Copyright 2023 Zachary Jeckell"],"rights_urls":[],"identifier_entries":[]},"links":{"outbound_url":"https://hdl.handle.net/2142/122063","outbound_label":"Handle","outbound_source":"dc:identifier"},"metadata_groups":[{"id":"people","label":"People","entries":[{"key":"dc:contributor","label":"Contributor","values":["Ruzic, David N","Sankaran, Mohan"]},{"key":"dc:creator","label":"Author","values":["Jeckell, Zachary Jon"]}]},{"id":"academic_context","label":"Academic Context","entries":[{"key":"dc:date","label":"Dc Date","values":["2023-12","2023-12-07"]},{"key":"dc:type","label":"Dc Type","values":["text"]},{"key":"thesis:degree_discipline","label":"Discipline","values":["Nuclear, Plasma, Radiolgc Engr"]},{"key":"thesis:degree_level","label":"Degree Level","values":["Thesis"]},{"key":"thesis:degree_name","label":"Degree Name","values":["M.S."]},{"key":"thesis:institution_name","label":"Thesis Institution Name","values":["University of Illinois at Urbana-Champaign"]}]},{"id":"subjects_keywords","label":"Subjects and Keywords","entries":[{"key":"dc:subject","label":"Dc Subject","values":["Atmospheric Pressure Plasma","Chemical Vapor Deposition","Silicon Oxide","Oxygen Diffusion Barrier","Optical Emission Spectroscopy","Lightweight Manufacturing"]}]},{"id":"language_rights","label":"Language and Rights","entries":[{"key":"dc:language","label":"Dc Language","values":["en","eng"]},{"key":"dc:rights","label":"Dc Rights","values":["Copyright 2023 Zachary Jeckell"]}]},{"id":"identifiers","label":"Identifiers","entries":[{"key":"dc:identifier","label":"Identifier","values":["https://hdl.handle.net/2142/122063"]}]},{"id":"additional","label":"Additional Metadata","entries":[{"key":"dc:description","label":"Description","values":["Submission original under an indefinite embargo labeled 'Open Access'. The submission was exported from vireo on 2024-03-01 without embargo terms","The student, Zachary Jeckell, accepted the attached license on 2023-12-05 at 10:49.","The student, Zachary Jeckell, submitted this Thesis for approval on 2023-12-05 at 11:03.","This Thesis was approved for publication on 2023-12-07 at 15:51.","DSpace SAF Submission Ingestion Package generated from Vireo submission #20139 on 2024-03-01 at 13:15:26","This work aims to demonstrate the barrier coating, and adhesion promoting properties of silica-based coatings deposited using an atmospheric pressure plasma torch (APPT). This is achieved by applying an industrial grade adhesive to silica thin films deposited, on the surfaces to be joined, using atmospheric pressure plasma chemical vapor deposition (APP-CVD), to make single joint lap shear samples of different metal combinations commonly found in lightweight manufacturing such as aluminum and magnesium as well as steel. To deposit these thin films, two separate silicon based organic precursors, hexamethyldisiloxane (HMDSO), and tetraethylorthosilicate (TEOS), are used. Samples are bonded using DuPont Betamate 1486 adhesive, and the lap shear results for these films are compared to the lap shear results of a chemically cleaned control using the same adhesive. The APPT uses a microwave power supply and gas mixtures of N2 and Ar. The adhesion of the films are tested using lap shear, and elevated temperature water soaks are conducted on the joints as well to simulate environmental exposure. Lap shear results from treated samples have max shear stresses that are 25%-115% higher compared to control samples depending on material. After exposure to water soak the max shear strength of the joints decreased by less than 15%, which demonstrates the films capabilities as a water barrier. Film morphology is examined using scanning electron microscopy (SEM), and the film’s composition and approximate thickness are obtained using Rutherford backscattering spectroscopy (RBS)."]},{"key":"dc:format","label":"Dc Format","values":["application/pdf"]},{"key":"dc:title","label":"Title","values":["Atmospheric pressure plasma chemical vapor deposition of silicon dioxide for improved adhesion and water intrusion resistance for lightweight manufacturing"]}]}],"canonical_facts":{"dc:contributor":["Ruzic, David N","Sankaran, Mohan"],"dc:creator":["Jeckell, Zachary Jon"],"dc:date":["2023-12","2023-12-07"],"dc:description":["Submission original under an indefinite embargo labeled 'Open Access'. The submission was exported from vireo on 2024-03-01 without embargo terms","The student, Zachary Jeckell, accepted the attached license on 2023-12-05 at 10:49.","The student, Zachary Jeckell, submitted this Thesis for approval on 2023-12-05 at 11:03.","This Thesis was approved for publication on 2023-12-07 at 15:51.","DSpace SAF Submission Ingestion Package generated from Vireo submission #20139 on 2024-03-01 at 13:15:26","This work aims to demonstrate the barrier coating, and adhesion promoting properties of silica-based coatings deposited using an atmospheric pressure plasma torch (APPT). This is achieved by applying an industrial grade adhesive to silica thin films deposited, on the surfaces to be joined, using atmospheric pressure plasma chemical vapor deposition (APP-CVD), to make single joint lap shear samples of different metal combinations commonly found in lightweight manufacturing such as aluminum and magnesium as well as steel. To deposit these thin films, two separate silicon based organic precursors, hexamethyldisiloxane (HMDSO), and tetraethylorthosilicate (TEOS), are used. Samples are bonded using DuPont Betamate 1486 adhesive, and the lap shear results for these films are compared to the lap shear results of a chemically cleaned control using the same adhesive. The APPT uses a microwave power supply and gas mixtures of N2 and Ar. The adhesion of the films are tested using lap shear, and elevated temperature water soaks are conducted on the joints as well to simulate environmental exposure. Lap shear results from treated samples have max shear stresses that are 25%-115% higher compared to control samples depending on material. After exposure to water soak the max shear strength of the joints decreased by less than 15%, which demonstrates the films capabilities as a water barrier. Film morphology is examined using scanning electron microscopy (SEM), and the film’s composition and approximate thickness are obtained using Rutherford backscattering spectroscopy (RBS)."],"dc:format":["application/pdf"],"dc:identifier":["https://hdl.handle.net/2142/122063"],"dc:language":["en","eng"],"dc:rights":["Copyright 2023 Zachary Jeckell"],"dc:subject":["Atmospheric Pressure Plasma","Chemical Vapor Deposition","Silicon Oxide","Oxygen Diffusion Barrier","Optical Emission Spectroscopy","Lightweight Manufacturing"],"dc:title":["Atmospheric pressure plasma chemical vapor deposition of silicon dioxide for improved adhesion and water intrusion resistance for lightweight manufacturing"],"dc:type":["text"],"thesis:degree_discipline":["Nuclear, Plasma, Radiolgc Engr"],"thesis:degree_level":["Thesis"],"thesis:degree_name":["M.S."],"thesis:institution_name":["University of Illinois at Urbana-Champaign"]},"updated_at":"2026-07-22T22:25:00Z"}