Atmospheric pressure plasma chemical vapor deposition of silicon dioxide for improved adhesion and water intrusion resistance for lightweight manufacturing
Submission original under an indefinite embargo labeled 'Open Access'. The submission was exported from vireo on 2024-03-01 without embargo terms
Atmospheric Pressure Plasma, Chemical Vapor Deposition, Silicon Oxide, Oxygen Diffusion Barrier, Optical Emission Spectroscopy, Lightweight Manufacturing
University of Illinois - Urbana-Champaign
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University of Illinois at Urbana-Champaign