Publikationsserver der RWTH Aachen University
Nanostructuring with diblock copolymers
Abstract
dc:descriptionTo date silicon technology remains the predominant tool for semiconductor engineering and device fabrication. In future, scalable nanotechnologies will complement current silicon technology and promise to extend the functionality of today’s semiconductor devices. In keeping up with the demands of the information age and Moore’s law, the emerging technologies will ultimately replace and supersede silicon microtechnology. On the nanoscale, where functionality depends on size, one of those emerging new technologies is directed self-assembly. In this thesis directed self-assembly of diblock copolymers was demonstrated to facilitate the defined and controlled positioning of noble metal nanoclusters in highly periodic and aperiodic patterns. Next to investigating the possibilities of self-assembly in connection with top-down patterning, our aim was to fabricate metallic nanowires as novel interconnects and functional components for future nanoscale devices. Two possible pathways towards nanowire formation were envisioned: - Pattering of dense-packed gold clusters into linear arrays and subsequent fusion by electroless growth - Formation and deposition of cylindrical micelles as flexible templates for nano-wire growth
Degree
thesis:*- Grantor dc:publisher
- Publikationsserver der RWTH Aachen University
- Year dc:date
- 2006
Author and committee
dc:creator, dc:contributor.*- Author dc:creator
-
- Ott, Marcell
- Contributors dc:contributor
-
- Möller, Martin
Subjects
dc:subject × 33- info:eu-repo/classification/ddc/530
- Nanostruktur
- Strukturierung
- Lithographie
- Lithographie <Halbleitertechnologie>
- Photolithographie
- Micelle
- Metallcluster
- Golddraht
- Gold
- Anionische Polymerisation
- Photopolymerisation
- Template-Effekt
- Matrizenpolymerisation
- Physik
- Fibroblasten
- Osteoblasten
- Nanowires
- Nanodrähte
- Edelmetallcluster
- mizellare Strukturen
- Copolymere
- Selbstorganisation
- Top-down approach
- Bottom-up approach
- self-assembly
- diblock copolymer
- self-organisation
- micellar approach
- top-down
- bottom-up
- micellar patterns
- PS-P2VP
Rights
dc:rights- Statement dc:rights
-
- info:eu-repo/semantics/openAccess
- Language dc:language
- eng