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Showing 1 to 5 of 5 for “"PS-P2VP"”.
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Self-assembly and selective swelling in Lamellar block copolymer photonic gels
… copolymer poly(styrene-b-2-vinylpyridine) (PS-P2VP) of symmetric composition self-assembles into alternating PS and P2VP layers parallel to the substrate after solvent vapor annealing. In solvents that are selective to P2VP, the P2VP layers swell while the PS layers remain glassy. The glassy …
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Nanoscale Investigation of Adhesion, Friction, and Wear in Chemically Heterogeneous Responsive Polymer Brushes
… adhesion, friction, and wear of polystyrene (PS) - poly(2-vinyl pyridine) (P2VP) and polystyrene - poly(acrylic acid) (PAA) binary brushes and corresponding monobrushes were investigated in dried state under controlled environment. Spin-coated films were also investigated for comparison. The …
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Switching of surface composition and morphology of binary polymer brushes
… brushes: polystyrene/poly(2-vinyl pyridine) (PS/P2VP), poly(styrene-co-2,3,4,5,6-pentafluorostyrene)/poly(methyl (meth)acrylate) (PSF/P(M)MA), and PS/PMMA were synthesized via two-step surface-initiated radical polymerization. Wetting experiments show that switching of brushes? surface …
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Complex nanostructures in triblock terpolymer thin films
… methacrylate) (PS-b-P2VP-b-PtBMA) triblock terpolymers with volume fractions f(PS) : f(P2VP) : f(PtBMA) = 1 : 1.2 : x, with x ranging from 3.05 to 4, is studied with a combinatorial gradient approach. Gradients in film thickness are prepared via thin film flow …
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Nanostructuring with diblock copolymers
To date silicon technology remains the predominant tool for semiconductor engineering and device fabrication. In future, scalable nanotechnologies will complement current silicon technology and promise to extend the functionality of today’s semiconductor devices. In keeping up with the demands of …