Plasma Assisted Cleaning by Electrostatics of Insulating Nanometer Scale Contamination from Materials Used in Integrated Circuit Manufacturing

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Name thesis:degree_name

M.S. (master's)

Level thesis:degree_level

Thesis

Discipline thesis:degree_discipline

Nuclear, Plasma, and Radiological Engineering

Year dc:date

2017

Author dc:creator

• Lytle, Wayne M.

• nuclear engineering
• plasma assisted cleaning
• electrostatic
• nanometer scale
• broad substrate cleaning technique
• particulate contamination removal

Statement dc:rights

• Copyright 2007 Wayne M. Lytle

Language dc:language

en

Handle dc:identifier

http://hdl.handle.net/2142/96442

OAI identifier oai:identifier

oai:www.ideals.illinois.edu:2142/96442