Plasma Assisted Cleaning by Electrostatics of Insulating Nanometer Scale Contamination from Materials Used in Integrated Circuit Manufacturing
type: CreativeWork
description: Made available in DSpace on 2017-07-06T18:55:12Z (GMT). No. of bitstreams: 3 Lytle_Wayne_M_MS.pdf: 27922220 bytes, checksum: 67faae2239adf87cba4f0a7f443a8456 (MD5) Lytle_Wayne_M_MS_ABS.pdf: 35267 bytes, checksum: 25efd85c0e399395e1a5a857fbd3a791 (MD5) license.txt: 4813 bytes, checksum: 715c4321821a960fa1a1e91d2ac7ebce (MD5) Previous issue date: 2007
abstract: Made available in DSpace on 2017-07-06T18:55:12Z (GMT). No. of bitstreams: 3 Lytle_Wayne_M_MS.pdf: 27922220 bytes, checksum: 67faae2239adf87cba4f0a7f443a8456 (MD5) Lytle_Wayne_M_MS_ABS.pdf: 35267 bytes, checksum: 25efd85c0e399395e1a5a857fbd3a791 (MD5) license.txt: 4813 bytes, checksum: 715c4321821a960fa1a1e91d2ac7ebce (MD5) Previous issue date: 2007
author: Lytle, Wayne M.
language: en
keywords: nuclear engineering, plasma assisted cleaning, electrostatic, nanometer scale, broad substrate cleaning technique, particulate contamination removal
date published: 2017-07-06T18:55:12Z
date modified: 2026-07-22T22:26:38Z
provider: University of Illinois - Urbana-Champaign
publisher: Networked Digital Library of Theses and Dissertations
type: WebPage
source organization: University of Illinois - Urbana-Champaign

PropertyValue
property ID: Handle
value: http://hdl.handle.net/2142/96442