Metal-assisted chemical etching as a disruptive platform for multi-dimensional semiconductor sculpting

Conventional top-down fabrication approaches for semiconductor manufacturing can be classified into dry (anisotropic) and wet etch (isotropic or orientation-dependent) processes. At present, fabrication of novel nanostructured morphologies like porous nanowires, nanopillars with tunable aspect ratios, spiral or helical-shaped array of pits, etc. is a major bottleneck to develop novel photonic or phononic device applications which can enable a much better understanding of their underlying physics, along with demonstrating functionalities that would otherwise be impossible. The work proposed in this dissertation involves the advancement of a recently discovered top-down fabrication approach called “Metal-assisted Chemical Etching (MacEtch)” which has the potential to overcome the current limitations of 1D and 3D semiconductor nanomanufacturing processes. The main focus is on the morphology, directionality, etch mechanisms and the influence of external electromagnetic fields to engrave novel structures in both silicon and III-V compound semiconductors. The outcome of this work can lead to advancement of knowledge in the areas of propagation of light and sound waves in a nanostructured dielectric material by demonstrating novel devices using our disruptive platform for manufacturing.

Name thesis:degree_name

Ph.D.

Level thesis:degree_level

Dissertation

Discipline thesis:degree_discipline

Electrical & Computer Engr

Grantor

University of Illinois at Urbana-Champaign

Year dc:date

2015

Author dc:creator

• Balasundaram, Karthik

Contributors dc:contributor

• Li, Xiuling
• Eden, Gary J.
• Ferreira, Placid M.
• Ruzic, David N.

• semiconductor
• Metal-assisted Chemical Etching (MacEtch)
• magnetic field

Statement dc:rights

• Copyright 2015 Karthik Balasundaram

Language dc:language

en

Handle dc:identifier

http://hdl.handle.net/2142/87969

OAI record oai:identifier

https://www.ideals.illinois.edu/oai-pmh?verb=GetRecord&metadataPrefix=etdms&identifier=oai%3Awww.ideals.illinois.edu%3A2142%2F87969