Global ETD Search
Search theses and dissertations gathered from participating repositories worldwide. Every result links back to the library that holds it. No account is needed.
Results
Showing 1 to 10 of 10 for “"Macetch"”.
-
Metal-assisted chemical etching of semiconductor nanostructures for electronic applications
Metal-assisted Chemical Etching (MacEtch) is a robust and versatile top-down etching process which has the capability of overcoming the limits of conventional wet and dry etching. The advantage of producing anisotropic high aspect ratio micro- and nanostructures with the absence of ion induced …
-
Inverse metal-assisted chemical etching of indium phosphide with sub-20 nm scalability
Metal-assisted chemical etching (MacEtch), a wet etching method developed in 2000, has been the focus of extensive research in the area of semiconductor nanotechnology for the last decade, mainly in Si. In principle, MacEtch can be applicable to the other semiconductors if there exists a …
-
Metal-assisted chemical etching of III-V semiconductors for advanced optoelectronic device fabrication
… is metal-assisted chemical etching (MacEtch), a plasma-free wet etching method that utilizes a metal catalyst in order to enhance directional etching of a semiconductor. MacEtch has found its place in etching a wide variety of semiconductor materials, which expands its application …
-
Metal-assisted chemical etching of β-gallium oxide
… by inverse metal-assisted chemical etching (MacEtch), under UV light irradiation, with a high aspect ratio and excellent surface quality, are demonstrated. The strongly crystal-orientation-dependent etching behaviors are found and three kinds of vertical structures are formed after the …
-
Metal-assisted chemical etching of 4H silicon carbide
Metal-assisted chemical etching (MacEtch) is a wet etching method that can produce high aspect ratio nanostructures with minimal crystal damage. The MacEtch process has been demonstrated to overcome limitations of dry and wet etching in several materials, studied extensively since its discovery by …
-
Nonlithographic manufacturing of 1-D silicon nanostructures with tunable surface morphology via thermal dewetting and metal-assisted chemical etching
… Followed by metal-assisted chemical etching (MacEtch), where the Au mesh serves as catalyst, arrays of smooth Si nanowires with tunable taper are produced. By using the Le Chatelier Principle, the rate of reduction relative to that of oxidation is increased by adding increasing amounts of …
-
Multigate MOSFETs for digital performance and high linearity, and their fabrication techniques
… inverse metal-assisted chemical etching (i-MacEtch), in lieu of conventional RIE etching, for 3D fin channel formation. InP junctionless FinFETs with record high-aspect-ratio (~ 50:1) fins are demonstrated by this method for the first time. The i-MacEtch process flow eliminates …
-
Metal-assisted chemical etching as a disruptive platform for multi-dimensional semiconductor sculpting
The student, Karthik Balasundaram, submitted this Dissertation for approval on 2015-06-18 at 16:07.
-
Metal-assisted chemical etching of β-gallium oxide and its device applications
Submission published under a 24 month embargo labeled 'U of I Access', the embargo will last until 2024-12-01
-
Metal-assisted chemical etching of III-V semiconductor materials for optoelectronic applications
Made available in DSpace on 2016-03-02T19:33:17Z (GMT). No. of bitstreams: 2 ZHAO-THESIS-2015.pdf: 2077971 bytes, checksum: 160453c3994747e9326d0908a0f90983 (MD5) LICENSE.txt: 4207 bytes, checksum: badcc874098be4440f0e37e192b9525d (MD5) Previous issue date: 2015-10-07