{"id":{"repo_id":"uiuc","oai_identifier":"oai:www.ideals.illinois.edu:2142/87969"},"canonical_url":"https://search.dev.ndltd.org/etd/uiuc/oai:www.ideals.illinois.edu:2142/87969","repository":{"repo_id":"uiuc","name":"University of Illinois - Urbana-Champaign","base_url":"https://www.ideals.illinois.edu/oai-pmh"},"display":{"title":"Metal-assisted chemical etching as a disruptive platform for multi-dimensional semiconductor sculpting","abstract":"The student, Karthik Balasundaram, submitted this Dissertation for approval on 2015-06-18 at 16:07.","abstract_html":"The student, Karthik Balasundaram, submitted this Dissertation for approval on 2015-06-18 at 16:07.","abstract_has_math":false,"creators":["Balasundaram, Karthik"],"institution":"University of Illinois at Urbana-Champaign","degree_name":"Ph.D.","degree_level":"Dissertation","degree_discipline":"Electrical & Computer Engr","degree_department":null,"school":null,"contributors":["Li, Xiuling","Eden, Gary J.","Ferreira, Placid M.","Ruzic, David N."],"advisors":[],"committee_chairs":[],"committee_members":[],"year":2015,"date_issued":"2015-09-29T20:37:46Z","date_published":"2015-09-29T20:37:46Z","updated_at":"2026-07-22T22:26:31Z","subjects":["semiconductor","Metal-assisted Chemical Etching (MacEtch)","magnetic field"],"languages":["en"],"rights":["Copyright 2015 Karthik Balasundaram"],"rights_urls":[],"identifier_entries":[]},"links":{"outbound_url":"http://hdl.handle.net/2142/87969","outbound_label":"Handle","outbound_source":"dc:identifier"},"metadata_groups":[{"id":"people","label":"People","entries":[{"key":"dc:contributor","label":"Contributor","values":["Li, Xiuling","Eden, Gary J.","Ferreira, Placid M.","Ruzic, David N."]},{"key":"dc:creator","label":"Author","values":["Balasundaram, Karthik"]}]},{"id":"academic_context","label":"Academic Context","entries":[{"key":"dc:date","label":"Dc Date","values":["2015-09-29T20:37:46Z","2015-08","2015-06-22","2015-8"]},{"key":"dc:type","label":"Dc Type","values":["text"]},{"key":"thesis:degree_discipline","label":"Discipline","values":["Electrical & Computer Engr"]},{"key":"thesis:degree_level","label":"Degree Level","values":["Dissertation"]},{"key":"thesis:degree_name","label":"Degree Name","values":["Ph.D."]},{"key":"thesis:institution_name","label":"Thesis Institution Name","values":["University of Illinois at Urbana-Champaign"]}]},{"id":"subjects_keywords","label":"Subjects and Keywords","entries":[{"key":"dc:subject","label":"Dc Subject","values":["semiconductor","Metal-assisted Chemical Etching (MacEtch)","magnetic field"]}]},{"id":"language_rights","label":"Language and Rights","entries":[{"key":"dc:language","label":"Dc Language","values":["en"]},{"key":"dc:rights","label":"Dc Rights","values":["Copyright 2015 Karthik Balasundaram"]}]},{"id":"identifiers","label":"Identifiers","entries":[{"key":"dc:identifier","label":"Identifier","values":["http://hdl.handle.net/2142/87969"]}]},{"id":"additional","label":"Additional Metadata","entries":[{"key":"dc:description","label":"Description","values":["The student, Karthik Balasundaram, submitted this Dissertation for approval on 2015-06-18 at 16:07.","This Dissertation was approved for publication on 2015-06-22 at 11:00.","DSpace SAF Submission Ingestion Package generated from Vireo submission #8290 on 2015-09-29 at 13:21:34","Conventional top-down fabrication approaches for semiconductor manufacturing can be classified into dry (anisotropic) and wet etch (isotropic or orientation-dependent) processes. At present, fabrication of novel nanostructured morphologies like porous nanowires, nanopillars with tunable aspect ratios, spiral or helical-shaped array of pits, etc. is a major bottleneck to develop novel photonic or phononic device applications which can enable a much better understanding of their underlying physics, along with demonstrating functionalities that would otherwise be impossible. The work proposed in this dissertation involves the advancement of a recently discovered top-down fabrication approach called “Metal-assisted Chemical Etching (MacEtch)” which has the potential to overcome the current limitations of 1D and 3D semiconductor nanomanufacturing processes. The main focus is on the morphology, directionality, etch mechanisms and the influence of external electromagnetic fields to engrave novel structures in both silicon and III-V compound semiconductors. The outcome of this work can lead to advancement of knowledge in the areas of propagation of light and sound waves in a nanostructured dielectric material by demonstrating novel devices using our disruptive platform for manufacturing.","Submission original under an indefinite embargo labeled 'Open Access'. The submission was exported from vireo on 2015-09-29 without embargo terms","The student, Karthik Balasundaram, accepted the attached license on 2015-06-18 at 15:54.","Made available in DSpace on 2015-09-29T20:37:46Z (GMT). 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At present, fabrication of novel nanostructured morphologies like porous nanowires, nanopillars with tunable aspect ratios, spiral or helical-shaped array of pits, etc. is a major bottleneck to develop novel photonic or phononic device applications which can enable a much better understanding of their underlying physics, along with demonstrating functionalities that would otherwise be impossible. The work proposed in this dissertation involves the advancement of a recently discovered top-down fabrication approach called “Metal-assisted Chemical Etching (MacEtch)” which has the potential to overcome the current limitations of 1D and 3D semiconductor nanomanufacturing processes. The main focus is on the morphology, directionality, etch mechanisms and the influence of external electromagnetic fields to engrave novel structures in both silicon and III-V compound semiconductors. 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