Modeling Plasma Equipment and Feature Profile in Ionized Metal Physical Vapor Deposition

A three-dimensional HPEM is employed to examine the consequences of asymmetric excitation due to the transmission line effects and irregular sputter tracks on species densities and fluxes. It was found that for typical conditions for Al IMPVD the metal species have improved symmetry due to charge exchange reactions and subsequent diffusion. The symmetry and uniformity of the metal species above the wafer significantly improve when increasing the aspect ratio of the plasma region or increasing the pressure, accompanied by a decrease in the magnitude of metal fluxes. Irregular sputter tracks act as asymmetric sources and cause asymmetries in the sputtered metal species and their fluxes to the substrate.

Name thesis:degree_name

Ph.D.

Level thesis:degree_level

Dissertation

Discipline thesis:degree_discipline

Mechanical Engineering

Grantor

University of Illinois at Urbana-Champaign

Year dc:date

2015

Author dc:creator

• Lu, Junqing

Contributors dc:contributor

• Kushner, Mark J.

• Engineering, Materials Science

Language dc:language

eng

Identifier

(MiAaPQ)AAI3017155

OAI identifier oai:identifier

oai:www.ideals.illinois.edu:2142/83756