Chemical Vapor Deposition of Transition Metal Diborides From Borohydride Precursors

Both HfB2 and CrB2 depositions were highly conformal. For example, a 65 nm wide trench with a 19:1 depth-width aspect ratio was coated uniformly with HfB2. The coverage improved further when an additional flux of a growth suppressor was added during deposition. Super-conformal CrB2 films were deposited by using atomic hydrogen, produced in a remote plasma source, as the suppressor. Growth suppression by atomic nitrogen enabled bottom-up filling of a 19:1 aspect ratio trench with an Hf-B-N film.

Name thesis:degree_name

Ph.D.

Level thesis:degree_level

Dissertation

Discipline thesis:degree_discipline

Materials Science and Engineering

Grantor

University of Illinois at Urbana-Champaign

Year dc:date

2015

Author dc:creator

• Jayaraman, Sreenivas

Contributors dc:contributor

• Abelson, John R.

• Chemistry, Inorganic

Language dc:language

eng

Identifier

(MiAaPQ)AAI3199029

OAI identifier oai:identifier

oai:www.ideals.illinois.edu:2142/82770