{"id":{"repo_id":"uiuc","oai_identifier":"oai:www.ideals.illinois.edu:2142/82770"},"canonical_url":"https://search.dev.ndltd.org/etd/uiuc/oai:www.ideals.illinois.edu:2142/82770","repository":{"repo_id":"uiuc","name":"University of Illinois - Urbana-Champaign","base_url":"https://www.ideals.illinois.edu/oai-pmh"},"display":{"title":"Chemical Vapor Deposition of Transition Metal Diborides From Borohydride Precursors","abstract":"Both HfB2 and CrB2 depositions were highly conformal. For example, a 65 nm wide trench with a 19:1 depth-width aspect ratio was coated uniformly with HfB2. The coverage improved further when an additional flux of a growth suppressor was added during deposition. Super-conformal CrB2 films were deposited by using atomic hydrogen, produced in a remote plasma source, as the suppressor. Growth suppression by atomic nitrogen enabled bottom-up filling of a 19:1 aspect ratio trench with an Hf-B-N film.","abstract_html":"Both HfB2 and CrB2 depositions were highly conformal. For example, a 65 nm wide trench with a 19:1 depth-width aspect ratio was coated uniformly with HfB2. The coverage improved further when an additional flux of a growth suppressor was added during deposition. Super-conformal CrB2 films were deposited by using atomic hydrogen, produced in a remote plasma source, as the suppressor. Growth suppression by atomic nitrogen enabled bottom-up filling of a 19:1 aspect ratio trench with an Hf-B-N film.","abstract_has_math":false,"creators":["Jayaraman, Sreenivas"],"institution":"University of Illinois at Urbana-Champaign","degree_name":"Ph.D.","degree_level":"Dissertation","degree_discipline":"Materials Science and Engineering","degree_department":null,"school":null,"contributors":["Abelson, John R."],"advisors":[],"committee_chairs":[],"committee_members":[],"year":2015,"date_issued":"2015-09-25T20:52:56Z","date_published":"2015-09-25T20:52:56Z","updated_at":"2026-07-22T22:26:18Z","subjects":["Chemistry, Inorganic"],"languages":["eng"],"rights":[],"rights_urls":[],"identifier_entries":[{"key":"dc:identifier","label":"Identifier","values":["(MiAaPQ)AAI3199029"],"render_values":[{"text":"(MiAaPQ)AAI3199029","href":null,"code":true}]}]},"links":{"outbound_url":"http://hdl.handle.net/2142/82770","outbound_label":"Handle","outbound_source":"dc:identifier"},"metadata_groups":[{"id":"people","label":"People","entries":[{"key":"dc:contributor","label":"Contributor","values":["Abelson, John R."]},{"key":"dc:creator","label":"Author","values":["Jayaraman, Sreenivas"]}]},{"id":"academic_context","label":"Academic Context","entries":[{"key":"dc:date","label":"Dc Date","values":["2015-09-25T20:52:56Z","10000-01-01","2005"]},{"key":"dc:type","label":"Dc Type","values":["text"]},{"key":"thesis:degree_discipline","label":"Discipline","values":["Materials Science and Engineering"]},{"key":"thesis:degree_level","label":"Degree Level","values":["Dissertation"]},{"key":"thesis:degree_name","label":"Degree Name","values":["Ph.D."]},{"key":"thesis:institution_name","label":"Thesis Institution Name","values":["University of Illinois at Urbana-Champaign"]}]},{"id":"subjects_keywords","label":"Subjects and Keywords","entries":[{"key":"dc:subject","label":"Dc Subject","values":["Chemistry, Inorganic"]}]},{"id":"language_rights","label":"Language and Rights","entries":[{"key":"dc:language","label":"Dc Language","values":["eng"]}]},{"id":"identifiers","label":"Identifiers","entries":[{"key":"dc:identifier","label":"Identifier","values":["http://hdl.handle.net/2142/82770","(MiAaPQ)AAI3199029"]}]},{"id":"additional","label":"Additional Metadata","entries":[{"key":"dc:description","label":"Description","values":["Both HfB2 and CrB2 depositions were highly conformal. For example, a 65 nm wide trench with a 19:1 depth-width aspect ratio was coated uniformly with HfB2. The coverage improved further when an additional flux of a growth suppressor was added during deposition. Super-conformal CrB2 films were deposited by using atomic hydrogen, produced in a remote plasma source, as the suppressor. Growth suppression by atomic nitrogen enabled bottom-up filling of a 19:1 aspect ratio trench with an Hf-B-N film.","Made available in DSpace on 2015-09-25T20:52:56Z (GMT). No. of bitstreams: 2 license.txt: 4848 bytes, checksum: 96035ab3f5e1c23cc7138a224ce498bd (MD5) 3199029.pdf: 3425448 bytes, checksum: 5c9c3f7e7ca592f9e491e61b75a1a17c (MD5) Previous issue date: 2005","Embargo set by: Seth Robbins for item 84051 Lift date: Forever Reason: Restricted to the U of I community idenfinitely during batch ingest of legacy ETDs","Restricted to the U of I community idenfinitely during batch ingest of legacy ETDs","U of I Only","127 p.","Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 2005."]},{"key":"dc:title","label":"Title","values":["Chemical Vapor Deposition of Transition Metal Diborides From Borohydride Precursors"]}]}],"canonical_facts":{"dc:contributor":["Abelson, John R."],"dc:creator":["Jayaraman, Sreenivas"],"dc:date":["2015-09-25T20:52:56Z","10000-01-01","2005"],"dc:description":["Both HfB2 and CrB2 depositions were highly conformal. For example, a 65 nm wide trench with a 19:1 depth-width aspect ratio was coated uniformly with HfB2. The coverage improved further when an additional flux of a growth suppressor was added during deposition. Super-conformal CrB2 films were deposited by using atomic hydrogen, produced in a remote plasma source, as the suppressor. Growth suppression by atomic nitrogen enabled bottom-up filling of a 19:1 aspect ratio trench with an Hf-B-N film.","Made available in DSpace on 2015-09-25T20:52:56Z (GMT). No. of bitstreams: 2 license.txt: 4848 bytes, checksum: 96035ab3f5e1c23cc7138a224ce498bd (MD5) 3199029.pdf: 3425448 bytes, checksum: 5c9c3f7e7ca592f9e491e61b75a1a17c (MD5) Previous issue date: 2005","Embargo set by: Seth Robbins for item 84051 Lift date: Forever Reason: Restricted to the U of I community idenfinitely during batch ingest of legacy ETDs","Restricted to the U of I community idenfinitely during batch ingest of legacy ETDs","U of I Only","127 p.","Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 2005."],"dc:identifier":["http://hdl.handle.net/2142/82770","(MiAaPQ)AAI3199029"],"dc:language":["eng"],"dc:subject":["Chemistry, Inorganic"],"dc:title":["Chemical Vapor Deposition of Transition Metal Diborides From Borohydride Precursors"],"dc:type":["text"],"thesis:degree_discipline":["Materials Science and Engineering"],"thesis:degree_level":["Dissertation"],"thesis:degree_name":["Ph.D."],"thesis:institution_name":["University of Illinois at Urbana-Champaign"]},"updated_at":"2026-07-22T22:26:18Z"}