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University of Illinois at Urbana-Champaign
Control of Thin-Film Silicon Microstructure With Low-Energy Particle Bombardment in Reactive Sputtering
Abstract
dc:descriptionHydrogen can be added to the growth chamber to promote a phase change to nanocrystalline silicon at moderate growth temperatures. The growth flux with hydrogen includes energetic (∼100eV) neutral H, produced by the reflection of H2+ions from the target. We determine the kinetic role of these fast H neutrals in the nanocrystalline phase formation by substituting D for H during growth. Crystallization is enhanced with D; we suggest that this higher mass specie enhances a sub-surface restructuring process by enhanced momentum transfer to silicon atoms.
Degree
thesis:*- Name thesis:degree_name
- Ph.D.
- Level thesis:degree_level
- Dissertation
- Discipline thesis:degree_discipline
- Materials Science and Engineering
- Grantor
- University of Illinois at Urbana-Champaign
- Year dc:date
- 2015
Author and committee
dc:creator, dc:contributor.*- Author dc:creator
-
- Gerbi, Jennifer Elizabeth
- Contributors dc:contributor
-
- Abelson, John Robert
Subjects
dc:subject × 1Rights
- Language dc:language
- eng
Identifiers
dc:identifier.*- Identifier
- (MiAaPQ)AAI3017080
- OAI identifier oai:identifier
- oai:www.ideals.illinois.edu:2142/82698