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Showing 1 to 20 of 26 for “"Reactive Sputtering"”.
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Optical modeling off-stoichiometric amorphous Al2O3 thin films deposited by reactive sputtering
… thin films were deposited by the reactive sputtering, which enabled us to vary the composition of films by controlling the oxygen flow ratio fed into the deposition system. The composition of the films was investigated with X-ray photoelectron spectroscopy (XPS). This technique …
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The ion-beam reactive sputtering process for deposition of niobium nitride thin films
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1990.
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Control of Thin-Film Silicon Microstructure With Low-Energy Particle Bombardment in Reactive Sputtering
Hydrogen can be added to the growth chamber to promote a phase change to nanocrystalline silicon at moderate growth temperatures. The growth flux with hydrogen includes energetic (∼100eV) neutral H, produced by the reflection of H2+ions from the target. We determine the kinetic role of these …
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DC magnetron reactive sputtering of low stress AlN piezoelectric thin films for MEMS application
Microelectromechanical systems (MEMS) often incorporate piezoelectric thin films to actuate and detect motion of mechanical structures. Aluminum nitride is advantageous for MEMS use because it can be deposited at low temperatures, is easily patterned using conventional photolithographic techniques, …
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Deposition, Characterization, and Fabrication of a Zinc Oxide Piezoelectric Thin Film Microspeaker Using DC Reactive Sputtering
… fabricated using a thin film ZnO layer that was reactively DC sputtered onto a single crystalline n-type silicon substrate. When tested the microspeaker did not produce sound due to complications in the etching process, the thickness of the diaphragms, and clamping effects. Instead, a …
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Reactive Sputtering Deposition and Characterization of Zinc Nitride and Oxy-Nitride Films for Electronic and Photovoltaic Applications
… electronic and optoelectronic applications. Reactive radio-frequency (RF) magnetron sputtering was used as the deposition method, which potentially enables control of composition of the thin films, as well as fabrication of multilayer structures for the study of possible hetero-junctions …
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Characterization of the growth flux during the deposition of hydrogenated amorphous silicon by DC magnetron reactive sputtering
Item marked as restricted to the 'UIUC Users [automated]' Group (id=2) by Howard Ding (hding2@illinois.edu) on 2011-05-07T15:06:59Z Item is restricted indefinitely.
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Mechanisms of the Reactive Sputtering of Indium in Argon-Nitrogen and Nitrogen-Oxygen Discharges: Growth of Indium-Nitride, Indium-Oxynitride and Indium-Oxide Films
Made available in DSpace on 2014-12-14T16:00:42Z (GMT). No. of bitstreams: 1 8009116.pdf: 4068822 bytes, checksum: 396bc6d13f3353256bf717f4c6cf9bf5 (MD5) Previous issue date: 1979
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Deposition and characterization of HfO₂ thin films
… and silicon wafer substrates using magnetron RF reactive sputtering techniques. Structure and morphology of the thin films were investigated by x-ray diffraction (XRD), transmission electron microscopy (TEM) and scanning electron microscopy (SEM). Results revealed that the sputtered HfO₂ thin …
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Sputtering fabrication of silicon nitride and silicon oxide based dichroic mirrors
… refractive indices. This study explored the sputtering methods of thin-film multilayers to form dichroic mirrors in the visible spectrum for future solar-cell applications. Silicon oxide and silicon nitride targets were selected as materials used in the sputtering process. The sputtered …
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Chemically Enhanced Physical Vapor Deposition (Cepvd) of Tantalum Nitride-Based Films for Diffusion Barrier Layers Used in ULSI Devices
… phenomena. The model stems from the knowledge of reactive sputtering and PECVD processes as well as the acquired CEPVD experiment results. It correlates the processing parameters with the target and film surface coverage by Ta, TaN and organic sites, from which one can predict the operation mode, …
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Application of Pulsed D.C. Magnetron sputtering deposition for the component layers of CuInSe2 thin film photovoltaic cells
The Pulsed D.C. Magnetron Sputtering (PDMS) process has been investigated for thedeposition of the component layers that are used in the production of copper indiumdiselenide, CuInSe 2 (CIS), thin film solar cells. PDMS can use high plasma densities withlong term arc free operation for the reactive …
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Sputtered silicon oxynitride for microphotonics : a materials study
… and a silicon nitride target. The second is a reactive sputtering process from a silicon nitride target in an oxygen ambient. Silicon nitride sputtered from a silicon nitride target is also investigated. Models are provided that predict the index and composition in both the reactive and co- …
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An Investigation of Target Poisoning during Reactive Magnetron Sputtering
… During magnetron operation the inert and reactive gas flow were adjusted using mass flow controllers resulting in an operating pressure of about 0.3 Pa. The argon flow was fixed, whereas the nitrogen flow was varied to realize different states of target poisoning. In a fi?rst step the mass …
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Novel components by magnetron sputtering
… advent of the closed field unbalanced magnetron sputtering (CFUBMS)technique has provided a novel method for the production of ultra thick (above50(jm) multilayer coatings, which form free standing foils when removed from thesubstrate. Applications for this method range from the production of …
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Thin film magnetics for integrated magnetic nano-structures
… CoZrTaB-N\textsubscript{2} via methods such as reactive sputtering. Furthermore Spin-Reorientation Transition in amorphous CZTB magnetic multilayers is investigated. This interesting phenomenon results from from a tuneable value of residual stress arising from a thermal shock effect at elevated …
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Películas delgadas de nitruro de aluminio depositadas por pulverización y su aplicación a dispositivos de ondas acústicas
… films have been deposited by radiofrequency reactive sputtering; it is a very versatile technique commonly used in electronic technology that allows to obtain good-quality films at low deposition temperatures. The deposited material has been characterized by determining its composition, …
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Fabrication of Zinc Nitride Thin Films using RF Magnetron Sputtering Deposition for Optoelectronic Applications
… grow zinc nitride thin films using RF magnetron sputtering, understand its mechanical, optical, and electrical properties, and investigate its performance as light sensing devices.Synthesis and characterization of zinc nitride thin films has been investigated in this work. An RF magnetron …
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Synthesis and characterization of metal oxide semiconductors for photoelectrochemical hydrogen production
… prepared by using radio- frequency (RF) reactive magnetron sputtering for photoelectrochemical (PEC) applications. Metal-oxide thin films as a photoelectrode are of special interest for PEC systems to produce hydrogen in an aqueous solution by solar energy due to their low cost and …
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Ordered photonic microstructures
… films of the rare earth oxide were deposited via reactive sputtering of Er metal in an Ar/02 ambient, and subsequently annealed to promote grain growth. Heat treatment consisting of a 650°C followed by 1000°C anneal produces maximum crystallinity as measured by glancing angle x-ray diffraction. …
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