Back to results

University of Illinois at Urbana-Champaign

Mechanisms of the Reactive Sputtering of Indium in Argon-Nitrogen and Nitrogen-Oxygen Discharges: Growth of Indium-Nitride, Indium-Oxynitride and Indium-Oxide Films

Abstract

dc:description

Made available in DSpace on 2014-12-14T16:00:42Z (GMT). No. of bitstreams: 1 8009116.pdf: 4068822 bytes, checksum: 396bc6d13f3353256bf717f4c6cf9bf5 (MD5) Previous issue date: 1979

Degree

thesis:*
Name thesis:degree_name
Ph.D.
Level thesis:degree_level
Dissertation
Discipline thesis:degree_discipline
Metallurgical Engineering
Grantor
University of Illinois at Urbana-Champaign
Year dc:date
2014

Author and committee

dc:creator, dc:contributor.*
Author dc:creator
  • Natarajan, Bangalore Ramaswamiengar

Subjects

dc:subject × 1

Rights

Language dc:language
eng

Identifiers

dc:identifier.*
Identifier
(UMI)AAI8009116
OAI identifier oai:identifier
oai:www.ideals.illinois.edu:2142/68640

Chain of custody

source
Harvested from
University of Illinois - Urbana-Champaign
Base URL
www.ideals.illinois.edu/oai-pmh
Last updated
2026-07-22
Source record
OAI-PMH GetRecord
citation

Natarajan, Bangalore Ramaswamiengar. Mechanisms of the Reactive Sputtering of Indium in Argon-Nitrogen and Nitrogen-Oxygen Discharges: Growth of Indium-Nitride, Indium-Oxynitride and Indium-Oxide Films. Dissertation thesis, University of Illinois at Urbana-Champaign, 2014. http://hdl.handle.net/2142/68640