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University of Illinois at Urbana-Champaign
Mechanisms of the Reactive Sputtering of Indium in Argon-Nitrogen and Nitrogen-Oxygen Discharges: Growth of Indium-Nitride, Indium-Oxynitride and Indium-Oxide Films
Abstract
dc:descriptionMade available in DSpace on 2014-12-14T16:00:42Z (GMT). No. of bitstreams: 1 8009116.pdf: 4068822 bytes, checksum: 396bc6d13f3353256bf717f4c6cf9bf5 (MD5) Previous issue date: 1979
Degree
thesis:*- Name thesis:degree_name
- Ph.D.
- Level thesis:degree_level
- Dissertation
- Discipline thesis:degree_discipline
- Metallurgical Engineering
- Grantor
- University of Illinois at Urbana-Champaign
- Year dc:date
- 2014
Author and committee
dc:creator, dc:contributor.*- Author dc:creator
-
- Natarajan, Bangalore Ramaswamiengar
Subjects
dc:subject × 1Rights
- Language dc:language
- eng
Identifiers
dc:identifier.*- Identifier
- (UMI)AAI8009116
- OAI identifier oai:identifier
- oai:www.ideals.illinois.edu:2142/68640