Heated atomic force microscope cantilever with high resistivity and improved temperature sensitivity for nanotopography sensing

This thesis reports thermal nanotopography sensing with an atomic force microscope using a high-resistivity (HR) heated cantilever and a previously studied low-resistivity (LR) heated cantilever, with respective heater doping concentrations of 1 x 10^16 cm^-3 and 3 x 10^17 cm^-3. The HR cantilever temperature sensitivity on a 100 nm tall silicon grating improves by more than two times compared to the LR cantilever sensitivity in the range 100ºC – 300ºC. The HR cantilever achieves a sensitivity of 0.37 mV/nm at 300 ºC, compared to 0.15 mV/nm using the LR cantilever. The higher sensitivity can be attributed to the temperature coefficient of resistance of the HR cantilever having a value of 0.102 C^-1, a 13X increase over the LR cantilever value of 0.008 C^-1. The HR cantilever is shown to be better-suited than the LR cantilever for potential metrology applications, by thermally imaging a temperature-sensitive material, a 110 nm tall photoresist grating (AZ1518).

Name thesis:degree_name

M.S.

Level thesis:degree_level

Thesis

Discipline thesis:degree_discipline

Mechanical Engineering

Grantor

University of Illinois at Urbana-Champaign

Year dc:date

2013

Author dc:creator

• Liu, Joseph

Contributors dc:contributor

• King, William P.

• Atomic-force microscope (AFM)
• cantilever
• nanotopography

Statement dc:rights

• Copyright 2013 Joseph Liu

Language dc:language

en

Handle dc:identifier

http://hdl.handle.net/2142/44109

OAI identifier oai:identifier

oai:www.ideals.illinois.edu:2142/44109