{"id":{"repo_id":"uiuc","oai_identifier":"oai:www.ideals.illinois.edu:2142/44109"},"canonical_url":"https://search.dev.ndltd.org/etd/uiuc/oai:www.ideals.illinois.edu:2142/44109","repository":{"repo_id":"uiuc","name":"University of Illinois - Urbana-Champaign","base_url":"https://www.ideals.illinois.edu/oai-pmh"},"display":{"title":"Heated atomic force microscope cantilever with high resistivity and improved temperature sensitivity for nanotopography sensing","abstract":"This thesis reports thermal nanotopography sensing with an atomic force microscope using a high-resistivity (HR) heated cantilever and a previously studied low-resistivity (LR) heated cantilever, with respective heater doping concentrations of 1 x 10^16 cm^-3 and 3 x 10^17 cm^-3. The HR cantilever temperature sensitivity on a 100 nm tall silicon grating improves by more than two times compared to the LR cantilever sensitivity in the range 100ºC – 300ºC. The HR cantilever achieves a sensitivity of 0.37 mV/nm at 300 ºC, compared to 0.15 mV/nm using the LR cantilever. The higher sensitivity can be attributed to the temperature coefficient of resistance of the HR cantilever having a value of 0.102 C^-1, a 13X increase over the LR cantilever value of 0.008 C^-1. The HR cantilever is shown to be better-suited than the LR cantilever for potential metrology applications, by thermally imaging a temperature-sensitive material, a 110 nm tall photoresist grating (AZ1518).","abstract_html":"This thesis reports thermal nanotopography sensing with an atomic force microscope using a high-resistivity (HR) heated cantilever and a previously studied low-resistivity (LR) heated cantilever, with respective heater doping concentrations of 1 x 10^16 cm^-3 and 3 x 10^17 cm^-3. The HR cantilever temperature sensitivity on a 100 nm tall silicon grating improves by more than two times compared to the LR cantilever sensitivity in the range 100ºC – 300ºC. The HR cantilever achieves a sensitivity of 0.37 mV/nm at 300 ºC, compared to 0.15 mV/nm using the LR cantilever. The higher sensitivity can be attributed to the temperature coefficient of resistance of the HR cantilever having a value of 0.102 C^-1, a 13X increase over the LR cantilever value of 0.008 C^-1. The HR cantilever is shown to be better-suited than the LR cantilever for potential metrology applications, by thermally imaging a temperature-sensitive material, a 110 nm tall photoresist grating (AZ1518).","abstract_has_math":false,"creators":["Liu, Joseph"],"institution":"University of Illinois at Urbana-Champaign","degree_name":"M.S.","degree_level":"Thesis","degree_discipline":"Mechanical Engineering","degree_department":null,"school":null,"contributors":["King, William P."],"advisors":[],"committee_chairs":[],"committee_members":[],"year":2013,"date_issued":"2013-05-24T21:50:59Z","date_published":"2013-05-24T21:50:59Z","updated_at":"2026-07-22T22:25:33Z","subjects":["Atomic-force microscope (AFM)","cantilever","nanotopography"],"languages":["en"],"rights":["Copyright 2013 Joseph Liu"],"rights_urls":[],"identifier_entries":[]},"links":{"outbound_url":"http://hdl.handle.net/2142/44109","outbound_label":"Handle","outbound_source":"dc:identifier"},"metadata_groups":[{"id":"people","label":"People","entries":[{"key":"dc:contributor","label":"Contributor","values":["King, William P."]},{"key":"dc:creator","label":"Author","values":["Liu, Joseph"]}]},{"id":"academic_context","label":"Academic Context","entries":[{"key":"dc:date","label":"Dc Date","values":["2013-05-24T21:50:59Z","2013-05"]},{"key":"dc:type","label":"Dc Type","values":["text"]},{"key":"thesis:degree_discipline","label":"Discipline","values":["Mechanical Engineering"]},{"key":"thesis:degree_level","label":"Degree Level","values":["Thesis"]},{"key":"thesis:degree_name","label":"Degree Name","values":["M.S."]},{"key":"thesis:institution_name","label":"Thesis Institution Name","values":["University of Illinois at Urbana-Champaign"]}]},{"id":"subjects_keywords","label":"Subjects and Keywords","entries":[{"key":"dc:subject","label":"Dc Subject","values":["Atomic-force microscope (AFM)","cantilever","nanotopography"]}]},{"id":"language_rights","label":"Language and Rights","entries":[{"key":"dc:language","label":"Dc Language","values":["en"]},{"key":"dc:rights","label":"Dc Rights","values":["Copyright 2013 Joseph Liu"]}]},{"id":"identifiers","label":"Identifiers","entries":[{"key":"dc:identifier","label":"Identifier","values":["http://hdl.handle.net/2142/44109"]}]},{"id":"additional","label":"Additional Metadata","entries":[{"key":"dc:description","label":"Description","values":["This thesis reports thermal nanotopography sensing with an atomic force microscope using a high-resistivity (HR) heated cantilever and a previously studied low-resistivity (LR) heated cantilever, with respective heater doping concentrations of 1 x 10^16 cm^-3 and 3 x 10^17 cm^-3. The HR cantilever temperature sensitivity on a 100 nm tall silicon grating improves by more than two times compared to the LR cantilever sensitivity in the range 100ºC – 300ºC. The HR cantilever achieves a sensitivity of 0.37 mV/nm at 300 ºC, compared to 0.15 mV/nm using the LR cantilever. The higher sensitivity can be attributed to the temperature coefficient of resistance of the HR cantilever having a value of 0.102 C^-1, a 13X increase over the LR cantilever value of 0.008 C^-1. The HR cantilever is shown to be better-suited than the LR cantilever for potential metrology applications, by thermally imaging a temperature-sensitive material, a 110 nm tall photoresist grating (AZ1518).","Item withdrawn by Mark Zulauf (zulauf@illinois.edu) on 2013-04-24T22:02:01Z Item was in collections: University of Illinois Theses & Dissertations (ID: 1) No. of bitstreams: 2 Liu_Joseph.docx: 3644411 bytes, checksum: bf812a6ec3c6814700d66e5cfe76d7a0 (MD5) Liu_Joseph.pdf: 1342625 bytes, checksum: 35389c9fa897ce5093b20718a0e9edcc (MD5)","Made available in DSpace on 2013-05-24T21:50:59Z (GMT). No. of bitstreams: 3 Joseph_Liu.pdf: 1342515 bytes, checksum: 75e6ec03db0865dfa81a97e4bd2d2e26 (MD5) Liu_Joseph.docx: 3643140 bytes, checksum: 3954531bb80566d438ef9a7d0370a792 (MD5) license.txt: 4058 bytes, checksum: d1975a7e7b3e974718c086c2100cd732 (MD5)"]},{"key":"dc:title","label":"Title","values":["Heated atomic force microscope cantilever with high resistivity and improved temperature sensitivity for nanotopography sensing"]}]}],"canonical_facts":{"dc:contributor":["King, William P."],"dc:creator":["Liu, Joseph"],"dc:date":["2013-05-24T21:50:59Z","2013-05"],"dc:description":["This thesis reports thermal nanotopography sensing with an atomic force microscope using a high-resistivity (HR) heated cantilever and a previously studied low-resistivity (LR) heated cantilever, with respective heater doping concentrations of 1 x 10^16 cm^-3 and 3 x 10^17 cm^-3. The HR cantilever temperature sensitivity on a 100 nm tall silicon grating improves by more than two times compared to the LR cantilever sensitivity in the range 100ºC – 300ºC. The HR cantilever achieves a sensitivity of 0.37 mV/nm at 300 ºC, compared to 0.15 mV/nm using the LR cantilever. The higher sensitivity can be attributed to the temperature coefficient of resistance of the HR cantilever having a value of 0.102 C^-1, a 13X increase over the LR cantilever value of 0.008 C^-1. The HR cantilever is shown to be better-suited than the LR cantilever for potential metrology applications, by thermally imaging a temperature-sensitive material, a 110 nm tall photoresist grating (AZ1518).","Item withdrawn by Mark Zulauf (zulauf@illinois.edu) on 2013-04-24T22:02:01Z Item was in collections: University of Illinois Theses & Dissertations (ID: 1) No. of bitstreams: 2 Liu_Joseph.docx: 3644411 bytes, checksum: bf812a6ec3c6814700d66e5cfe76d7a0 (MD5) Liu_Joseph.pdf: 1342625 bytes, checksum: 35389c9fa897ce5093b20718a0e9edcc (MD5)","Made available in DSpace on 2013-05-24T21:50:59Z (GMT). No. of bitstreams: 3 Joseph_Liu.pdf: 1342515 bytes, checksum: 75e6ec03db0865dfa81a97e4bd2d2e26 (MD5) Liu_Joseph.docx: 3643140 bytes, checksum: 3954531bb80566d438ef9a7d0370a792 (MD5) license.txt: 4058 bytes, checksum: d1975a7e7b3e974718c086c2100cd732 (MD5)"],"dc:identifier":["http://hdl.handle.net/2142/44109"],"dc:language":["en"],"dc:rights":["Copyright 2013 Joseph Liu"],"dc:subject":["Atomic-force microscope (AFM)","cantilever","nanotopography"],"dc:title":["Heated atomic force microscope cantilever with high resistivity and improved temperature sensitivity for nanotopography sensing"],"dc:type":["text"],"thesis:degree_discipline":["Mechanical Engineering"],"thesis:degree_level":["Thesis"],"thesis:degree_name":["M.S."],"thesis:institution_name":["University of Illinois at Urbana-Champaign"]},"updated_at":"2026-07-22T22:25:33Z"}