An investigation of the temperature distribution induced during laser chemical vapor deposition (LCVD) of titanium nitride on titanium-aluminum-vanadium

To understand how the substrate temperature influences the deposition rate and spatial profile of deposits formed using laser chemical vapor deposition (LCVD), spatially resolved multi-wavelength pyrometry measurements of the substrate temperature have been made during LCVD of titanium nitride (TiN) on Ti-6Al-4V substrates. The precursors that have been used are TiCl$\sb4,$ N$\sb2,$ and H$\sb2.$ Also, deposition has been studied as a function of the N$\sb2$:H$\sb2$ gas ratio, the TiCl$\sb4$ partial pressure, the total chamber pressure, and the laser power. Also, film thickness has been measured by stylus profilometry, and film composition and microstructure have been determined by Scanning Electron Microscopy (SEM), Auger Electron Spectroscopy (AES), and X-ray Photoelectron Spectroscopy (XPS).

Name thesis:degree_name

Ph.D.

Level thesis:degree_level

Dissertation

Discipline thesis:degree_discipline

Mechanical Science and Engineering

Grantor

University of Illinois at Urbana-Champaign

Year dc:date

2011

Author dc:creator

• Azer, Magdi Naim

Contributors dc:contributor

• Mazumder, Jyotirmoy

• Engineering, Mechanical
• Engineering, Materials Science

Statement dc:rights

• Copyright 1996 Azer, Magdi Naim

Language dc:language

eng

Identifier

9780591087796
AAI9702453
(UMI)AAI9702453

OAI identifier oai:identifier

oai:www.ideals.illinois.edu:2142/22468