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University of Illinois at Urbana-Champaign

Thermal and photochemical vapor deposition of aluminum nitride and gallium nitride

Abstract

dc:description

Currently, the optical spectrum of the III-V compound semiconductors has been largely confined, with a few notable exceptions, to the visible red-orange to infrared portion of the electromagnetic spectrum ($\sim$650 nm to $\sim$1550 nm). The AlGaN material system may be able to extend this range to the visible green, blue and even ultraviolet regions. The current status of work on the column III-nitride system of compound semiconductors is reviewed with special attention given to the material challenges presently limiting sophisticated device development. Furthermore, the organometallic vapor phase epitaxy (OMVPE) method of growing these materials is discussed in detail in terms of process physics and reactor design and operation.

Degree

thesis:*
Name thesis:degree_name
Ph.D.
Level thesis:degree_level
Dissertation
Discipline thesis:degree_discipline
Electrical and Computer Engineering
Grantor
University of Illinois at Urbana-Champaign
Year dc:date
2011

Author and committee

dc:creator, dc:contributor.*
Author dc:creator
  • Alwan, James Jamil
Contributors dc:contributor
  • Eden, James G.

Subjects

dc:subject × 2

Rights

dc:rights
Statement dc:rights
  • Copyright 1994 Alwan, James Jamil
Language dc:language
eng

Identifiers

dc:identifier.*
Identifier
AAI9512285
(UMI)AAI9512285
OAI identifier oai:identifier
oai:www.ideals.illinois.edu:2142/21529

Chain of custody

source
Harvested from
University of Illinois - Urbana-Champaign
Base URL
www.ideals.illinois.edu/oai-pmh
Last updated
2026-07-22
Source record
OAI-PMH GetRecord
citation

Alwan, James Jamil. Thermal and photochemical vapor deposition of aluminum nitride and gallium nitride. Dissertation thesis, University of Illinois at Urbana-Champaign, 2011. http://hdl.handle.net/2142/21529