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University of Illinois at Urbana-Champaign

Investigation of plasma diffusion in extreme ultraviolet lithography sources

dc:creator Panici, Gianluca

thesis:degree_name M.S.

dc:date2020

Abstract

dc:description

DSpace SAF Submission Ingestion Package generated from Vireo submission #14779 on 2020-02-28 at 17:16:36

Degree

thesis:*

Name thesis:degree_name: M.S.
Level thesis:degree_level: Thesis
Discipline thesis:degree_discipline: Nuclear, Plasma, Radiolgc Engr
Grantor: University of Illinois at Urbana-Champaign
Year dc:date: 2020

Author and committee

dc:creator, dc:contributor.*

Author dc:creator: Panici, Gianluca
Contributors dc:contributor: Ruzic, David N.
Curreli, Davide

Subjects

dc:subject × 4

Rights

dc:rights

Statement dc:rights: Copyright 2019 Gianluca Panici
Language dc:language: en

Identifiers

dc:identifier.*

Handle dc:identifier: http://hdl.handle.net/2142/106279
OAI identifier oai:identifier: oai:www.ideals.illinois.edu:2142/106279

Chain of custody

source

Harvested from: University of Illinois - Urbana-Champaign
Base URL: www.ideals.illinois.edu/oai-pmh
Last updated: 2026-07-22
Source record: OAI-PMH GetRecord

related terms

citation

Panici, Gianluca. Investigation of plasma diffusion in extreme ultraviolet lithography sources. Thesis thesis, University of Illinois at Urbana-Champaign, 2020. http://hdl.handle.net/2142/106279

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