Investigation of plasma diffusion in extreme ultraviolet lithography sources
type: CreativeWork
description: DSpace SAF Submission Ingestion Package generated from Vireo submission #14779 on 2020-02-28 at 17:16:36
abstract: DSpace SAF Submission Ingestion Package generated from Vireo submission #14779 on 2020-02-28 at 17:16:36
author: Panici, Gianluca
language: en
keywords: EUV, diffusion, plasma, lifetime
date published: 2020-03-02T22:03:23Z
date modified: 2026-07-22T22:24:45Z
provider: University of Illinois - Urbana-Champaign
publisher: Networked Digital Library of Theses and Dissertations
type: WebPage
source organization: University of Illinois at Urbana-Champaign

PropertyValue
property ID: Handle
value: http://hdl.handle.net/2142/106279