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Showing 1 to 20 of 82 for “"EUV"”.
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EUV Spectroscopy of Solar Active Region Jets
Title : EUV Spectroscopy of Solar Active Region Jets Abstract : The million degree temperature of the solar corona has been a continuing puzzle to scientists. A detailed study of energetic events such as solar flares, coronal mass ejection and solar jets may provide important clues about how …
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Hydrogen surface wave plasma cleaning of the EUV collector
… forward, a new technique, extreme ultraviolet (EUV) lithography, is being developed to replace existing technology. EUV light is generated by a laser-produced plasma as opposed to an excimer laser, bringing new challenges that must be overcome for the technology to be viable. One such challenge …
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Entwicklung eines Rastermikroskopes für den Einsatz an Laborquellen im EUV Spektralbereich
Im Rahmen dieser Arbeit wird der Aufbau eines kompakten, mobilen Labor-Rastermikroskopes beschrieben. Das Mikroskop ist konzipiert für den Einsatz mit Strahlung aus dem extrem ultravioletten Spektrum und konnte bei 13 und 17 nm Wellenlänge erfolgreich getestet werden. Der Anwendungsbereich läßt …
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Ultraviolet and EUV studies of selected structures in the solar corona
New UV and EUV observations of off-limb and upper solar corona made by the UltraViolet Coronagraph Spectrometer (UVCS) and the Coronal Diagnostic Spectrometer (CDS) on SOHO (Solar and Heliospheric Observatory) are presented in this thesis. These data were used to establish the physical properties, …
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Debris Characterization And Mitigation Of Droplet Laser Plasma Sources For Euv Lithography
Extreme ultraviolet lithography (EUVL) is a next generation lithographic techniques under development for fabricating semiconductor devices with feature sizes smaller than 32 nm. The optics to be used in the EUVL steppers is reflective optics with multilayer mirror coatings on each surface. The …
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Tin etching in an EUV source by inherent and surface wave plasma
Submission original under an indefinite embargo labeled 'Open Access'. The submission was exported from vireo on 2022-11-11 without embargo terms
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Using active contours for automated tracking of UV and EUV solar flare ribbons
Solar flare UV and EUV images show elongated bright ``ribbons'' that move over time. If these ribbons are assumed to locate the footpoints of magnetic field lines reconnecting in the corona then it is clear that studying their evolution can provide an important insight into the reconnection …
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Tools for Comparing ICON EUV Data with Different Ground Based and Space-based Proxies
… of four major instruments which are IVM, EUV, FUV and MIGHTI. This work is concentrated on the EUV instrument which measures the ionized oxygen densities in the F region of the Ionosphere. Different atmospheric model including the IRI and TIEGCM, along with data obtained from ground-based …
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Cleaning of tin debris by reactive ion etching in a discharge-produced EUV plasma source
Extreme ultraviolet lithography (EUVL) is a promising candidate for the next generation of lithography technique to continue Moore's law. Moore's law has been upheld by shrinking the feature size on devices and driving the development of faster and denser integrated chips. The short wavelength …
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Radiation Studies Of The Tin-doped Microscopic Droplet Laser Plasma Light Source Specific To Euv Lithography
Extreme ultraviolet lithography(EUVL) is being developed worldwide as the next generation technology to be inserted in ~ 2009 for the mass production of IC chips with feature sizes <35 nm. One major challenge to its implementation is the development of a 13.5 nm EUV source of radiation that meets …
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Time-resolved spectroscopic investigation of N2/H2 nanosecond pulsed discharges and EUV-induced low-temperature plasmas
Extreme ultraviolet (EUV) lithography is central to advanced semiconductor manufacturing, yet the low-density plasmas triggered by EUV photons in scanner-relevant environments remain only partially characterised. Their transient, photon-driven nature complicates invasive diagnostics and makes …
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Gibbsian Segregating Alloys Driven by Thermal and Concentration Gradients: A Potential Grazing Collector Optics Used in EUV Lithography
A critical issue for EUV lithography is the minimization of collector degradation from intense plasma erosion and debris deposition. Reflectivity and lifetime of the collector optics will be heavily dependent on surface chemistry interactions between fuels and various mirror materials, in addition …
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Reduced density hydrogenated silicon through reactive dc magnetron sputtering with secondary rf plasma discharge for EUV multilayer mirror application
Made available in DSpace on 2019-11-26T20:49:30Z (GMT). No. of bitstreams: 2 UHLIG-THESIS-2019.pdf: 3040065 bytes, checksum: 4444cd75305422a711eb398f1ec5e75c (MD5) LICENSE.txt: 4206 bytes, checksum: 5a9d596ce58190a77714e399a794eb23 (MD5) Previous issue date: 2019-07-18
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Extreme Ultraviolet Polarimetry with Laser-Generated High-Order Harmonics
We developed an extreme ultraviolet (EUV) polarimeter, which employs laser-generated high-order harmonics as the light source. This relatively high-flux directional EUV source has available wavelengths between 8 nm and 62 nm and easily rotatable linear polarization. The polarimeter will aid …
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Progress in coherent lithography using table-top extreme ultraviolet lasers
… describes alternative extreme ultraviolet (EUV) lithography techniques which combine table-top EUV laser and various cost-effective imaging strategies. For each technique, numerical simulations, system design, experiment result and its analysis will be presented. In chapter II, a brief …
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Extreme ultraviolet polarization optics for polarimetry of structured high harmonics
… generate table-top coherent extreme ultraviolet (EUV) and attosecond pulses. Polarization characterization in this spectral range is important to understand the phenomena of HHG and quantify the light used for experiments. Furthermore, polarization control allows for polarization-dependent …
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Tabletop coherent extreme ultraviolet and soft X-ray sources based on high harmonic generation
… order harmonics at the extreme ultraviolet (EUV) and soft X-ray range. Such an unprecedented broadband and coherent spectrum thus has many novel applications, one of which is to build tabletop coherent EUV and soft X-ray sources. The development of EUV and soft X-ray lasers is very …
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