Reduced density hydrogenated silicon through reactive dc magnetron sputtering with secondary rf plasma discharge for EUV multilayer mirror application

Made available in DSpace on 2019-11-26T20:49:30Z (GMT). No. of bitstreams: 2 UHLIG-THESIS-2019.pdf: 3040065 bytes, checksum: 4444cd75305422a711eb398f1ec5e75c (MD5) LICENSE.txt: 4206 bytes, checksum: 5a9d596ce58190a77714e399a794eb23 (MD5) Previous issue date: 2019-07-18

Name thesis:degree_name

M.S.

Level thesis:degree_level

Thesis

Discipline thesis:degree_discipline

Nuclear, Plasma, Radiolgc Engr

Grantor

University of Illinois at Urbana-Champaign

Year dc:date

2019

Author dc:creator

• Uhlig, Jan Peter

Contributors dc:contributor

• Ruzic, David N
• Andruczyk, Daniel

• Reduced Density Si
• Multilayer Mirror
• EUV

Statement dc:rights

• Copyright 2019 Jan Uhlig

Language dc:language

en

Handle dc:identifier

http://hdl.handle.net/2142/105822

OAI identifier oai:identifier

oai:www.ideals.illinois.edu:2142/105822