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Showing 1 to 20 of 103 for “"PECVD"”.
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Abscheidung und Charakterisierung von PECVD-Aluminiumoxidschichten
… essentially to cemented carbide. In the PECVD deposition process the ionised and excited gaseous particles are striking the film surface during the growing. By the collisions with ions adsorbed particles receive additional energy which leads to a high mobility and therefore to the change …
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Plasma and particles dynamics modeling in PECVD reactors.
Plasma and particles dynamics modeling in PECVD reactors.
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Amorphous silicon carbide solar cells fabricated using ECR-PECVD
<p>http://www.worldcat.org/oclc/44392774</p>
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Design and fabrication of asymmetric nanopores using pulsed PECVD
… plasma enhanced chemical vapor deposition (PECVD). Pulsed PECVD has been developed as a high throughput alternative to atomic layer deposition (ALD) to deliver self-limiting growth of thin films. The goal of this thesis is to extend the application of pulsed PECVD to fabricate asymmetric …
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THE USE OF PECVD SILICON OXYNITRIDE THIN-FILMS IN MICROELECTRONICS MANUFACTURING
… by plasma enhanced chemical vapor deposition (PECVD). Comparing with the conventional method using SiH₄ and N₂O as reactant gases, it provides a much wider range of film compositions that can meet many requirements. In addition, lower concentrations of hydrogen are incorporated into the films. …
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Study of surface kinetics in PECVD chamber cleaning using remote plasma source
The scope of this research work is to characterize the Transformer Coupled Toroidal Plasma (TCTP); to understand gas phase reactions and surface reactions of neutrals in the cleaning chamber by analyzing the concentration of neutrals in downstream cleaning process chamber; and to make a global …
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Low temperature (<150 °C) hydrogenated amorphous silicon grown by PECVD with source gas heating
… Plasma Enhanced Chemical Vapour Deposition (PECVD) is one of the most successful techniques currently in use for the deposition of device quality a-Si:H. However, there is an increasing desire to improve process compatibility with low cost, plastic substrates. This entails trying to reduce …
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Thin film amorphous silicon cells by inductive PECVD, with a view towards flexible substrates
… been fabricated using an inductively coupled PECVD reactor in order to investigate how the deposition conditions influenced their properties. Complete cells were deposited onto rigid and flexible substrates, and homogeneous thin films were grown to investigate their optical and electrical …
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Feasibility of Ellipsometric Sensor Development for Use During PECVD SiOx Coated Polymer Product Manufacturing
… as plasma enhanced chemical vapor deposition (PECVD), was interested in the feasibility of an in line measurement system for monitoring the deposited films on various polymer products. This project examined two different coated polymer products, polyethylene terephthalate (PET) beverage …
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Control of morphology for enhanced electronic transport in PECVD-grown a-Si : H Thin Films
Solar cells have become an increasingly viable alternative to traditional, pollution causing power generation methods. Although crystalline silicon (c-Si) modules make up most of the market, thin films such as hydrogenated amorphous silicon (a-Si:H) are attractive for use in solar cell modules …
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PECVD of silicon and titanium based coatings to enhance the biocompatibility of blood contacting biomedical devices
… surface characteristics were deposited by PECVD on 316L stainless steel substrates. Polymer-like SiOxCyHz, silica-like SiOx, titanium oxide TiO, and silicon-titanium mixed oxide coatings were deposited by plasma decomposition of organic molecules. An extensive study was done on silicon …
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Study of PECVD Films Containing Flourine and Carbon and Diamond Like Carbon Films for Ultra Low Dielectric Constant Interlayer Dielectric Applications
Lowering the capacitance of Back-end-of-line (BEOL) structures by decreasing the dielectric permittivity of the interlayer dielectric material in integrated circuits (ICs) lowers device delay times, power consumption and parasitic capacitance. a:C-F films that are thermally stable at 400C were …
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Optimisation of plasma enhanced chemical vapour deposition for silicon nitride photonics using optimal design of experiments
… as plasma enhanced chemical vapour deposition (PECVD) are required to enable back-end-of-line (BEOL) integration. The difficulty with optimising PECVD deposition of silicon nitride is that it includes many process parameters that affect the deposition and resulting properties of the film. Thus, …
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Al 2 O 3 thin films: relation between structural evolution, mechanical properties and stability
… alumina thin films, especially for the case of PECVD. This goal is achieved by experimental investigations of the PECVD process which show that the alpha-Al2O3 phase is obtained only at conditions with a low precursor ratio, a long pulse length and a high power density. These allow for more …
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Fabrication and Characterization of Silicon Rich Oxide (SRO) Thin Film Deposited by Plasma Enhanced CVD for Si Quantum Dot
… Enhanced Chemical Vapor Deposition (MW-PECVD), which has the potential of giving higher film quality for intrinsic Hydrogen involvement and less defects after chemical reactions. The electrical properties were not included in this thesis to directly show the advantages of PECVD materials …
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Chemical vapor deposition of polymeric films
… and plasma enhanced chemical vapor deposition (PECVD) of carbon films with PPN structure using PTCDA as precursor were carried out under different conditions. There is only limited information in literature on the synthesis of PPN films by PECVD process, which may allow deposition at a higher …
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