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Search theses and dissertations gathered from participating repositories worldwide. Every result links back to the library that holds it. No account is needed.
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Showing 1 to 20 of 93 for “"PECVD"”.
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Plasma and particles dynamics modeling in PECVD reactors.
Plasma and particles dynamics modeling in PECVD reactors.
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Amorphous silicon carbide solar cells fabricated using ECR-PECVD
<p>http://www.worldcat.org/oclc/44392774</p>
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Design and fabrication of asymmetric nanopores using pulsed PECVD
… plasma enhanced chemical vapor deposition (PECVD). Pulsed PECVD has been developed as a high throughput alternative to atomic layer deposition (ALD) to deliver self-limiting growth of thin films. The goal of this thesis is to extend the application of pulsed PECVD to fabricate asymmetric …
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THE USE OF PECVD SILICON OXYNITRIDE THIN-FILMS IN MICROELECTRONICS MANUFACTURING
… by plasma enhanced chemical vapor deposition (PECVD). Comparing with the conventional method using SiH₄ and N₂O as reactant gases, it provides a much wider range of film compositions that can meet many requirements. In addition, lower concentrations of hydrogen are incorporated into the films. …
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Study of surface kinetics in PECVD chamber cleaning using remote plasma source
The scope of this research work is to characterize the Transformer Coupled Toroidal Plasma (TCTP); to understand gas phase reactions and surface reactions of neutrals in the cleaning chamber by analyzing the concentration of neutrals in downstream cleaning process chamber; and to make a global …
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Low temperature (<150 °C) hydrogenated amorphous silicon grown by PECVD with source gas heating
… Plasma Enhanced Chemical Vapour Deposition (PECVD) is one of the most successful techniques currently in use for the deposition of device quality a-Si:H. However, there is an increasing desire to improve process compatibility with low cost, plastic substrates. This entails trying to reduce …
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Thin film amorphous silicon cells by inductive PECVD, with a view towards flexible substrates
… been fabricated using an inductively coupled PECVD reactor in order to investigate how the deposition conditions influenced their properties. Complete cells were deposited onto rigid and flexible substrates, and homogeneous thin films were grown to investigate their optical and electrical …
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Feasibility of Ellipsometric Sensor Development for Use During PECVD SiOx Coated Polymer Product Manufacturing
… as plasma enhanced chemical vapor deposition (PECVD), was interested in the feasibility of an in line measurement system for monitoring the deposited films on various polymer products. This project examined two different coated polymer products, polyethylene terephthalate (PET) beverage …
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Control of morphology for enhanced electronic transport in PECVD-grown a-Si : H Thin Films
Solar cells have become an increasingly viable alternative to traditional, pollution causing power generation methods. Although crystalline silicon (c-Si) modules make up most of the market, thin films such as hydrogenated amorphous silicon (a-Si:H) are attractive for use in solar cell modules …
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PECVD of silicon and titanium based coatings to enhance the biocompatibility of blood contacting biomedical devices
… surface characteristics were deposited by PECVD on 316L stainless steel substrates. Polymer-like SiOxCyHz, silica-like SiOx, titanium oxide TiO, and silicon-titanium mixed oxide coatings were deposited by plasma decomposition of organic molecules. An extensive study was done on silicon …
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Study of PECVD Films Containing Flourine and Carbon and Diamond Like Carbon Films for Ultra Low Dielectric Constant Interlayer Dielectric Applications
Lowering the capacitance of Back-end-of-line (BEOL) structures by decreasing the dielectric permittivity of the interlayer dielectric material in integrated circuits (ICs) lowers device delay times, power consumption and parasitic capacitance. a:C-F films that are thermally stable at 400C were …
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Fabrication and Characterization of Silicon Rich Oxide (SRO) Thin Film Deposited by Plasma Enhanced CVD for Si Quantum Dot
… Enhanced Chemical Vapor Deposition (MW-PECVD), which has the potential of giving higher film quality for intrinsic Hydrogen involvement and less defects after chemical reactions. The electrical properties were not included in this thesis to directly show the advantages of PECVD materials …
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Chemical vapor deposition of polymeric films
… and plasma enhanced chemical vapor deposition (PECVD) of carbon films with PPN structure using PTCDA as precursor were carried out under different conditions. There is only limited information in literature on the synthesis of PPN films by PECVD process, which may allow deposition at a higher …
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Study the structural properties of Ge nanoparticles formed by ion implantation and thermal annealing in nitride-base dielectric matrices
… four different matrices have considered: PECVD Si3N4, LPCVD Si3N4, PECVD SiO1.67N0.14 and PECVD SiO1.12N0.37. Size evolution and structural properties of NPs were examined as function of implantation conditions and the host matrix. Ge NPs were formed in plasma enhanced chemical vapour …
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Study the structural properties of Ge nanoparticles formed by ion implantation and thermal annealing in nitride-base dielectric matrices
… four different matrices have considered: PECVD Si3N4, LPCVD Si3N4, PECVD SiO1.67N0.14 and PECVD SiO1.12N0.37. Size evolution and structural properties of NPs were examined as function of implantation conditions and the host matrix. Ge NPs were formed in plasma enhanced chemical vapour …
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A study of carbon based materials for energy applications
… in nano-devices. Among the different techniques, PECVD is a relatively simple and low temperature process. It facilitates the growth of CNTs and graphene on particular sites of the substrate. The objective of this research project was to study the growth of CNTs and graphene using PECVD system and …
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Experimente und numerische Modellierung zum Ladungsträgertransport in a-Si:H/c-Si Heterodioden
… auf kristallinen Wafern unter Verwendung von PECVD (Plasma Enhanced Chemical Vapour Deposition) hergestellt. An diesen Heterodioden wurden Strom-Spannungskennlinien temperaturabhängig gemessen. Der Vergleich mit verschiedenen theoretischen Ladungsträgertransportmodellen deutet auf Tunneln von …
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Advanced materials, process, and designs for silicon photonic integration
… on SOI single crystalline silicon (c-Si or SOI), PECVD amorphous silicon (a-Si:H, or simplified as a-Si), and PECVD silicon nitride (SiNxHy) based single mode channel waveguides.We have previously identified that sidewall roughness scattering is the dominant loss mechanism for the TE mode in high …
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