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Shaker

Niedertemperatur-Deposition von Siliziumdioxid mittels Remote-PECVD

dc:creator Stein, Josef
dc:date1999

Degree

thesis:*
Grantor dc:publisher
Shaker
Year dc:date
1999

Author and committee

dc:creator, dc:contributor.*
Author dc:creator
  • Stein, Josef
Contributors dc:contributor
  • Kurz, Heinrich

Rights

dc:rights
Statement dc:rights
  • info:eu-repo/semantics/closedAccess
Language dc:language
ger

Identifiers

dc:identifier.*
Identifier
https://publications.rwth-aachen.de/search?p=id:%22RWTH-CONV-117775%22
OAI record oai:identifier
https://publications.rwth-aachen.de/oai2d?verb=GetRecord&metadataPrefix=oai_dc&identifier=oai%3Apublications.rwth-aachen.de%3A55640

Chain of custody

source
Harvested from
RWTH Aachen University
Base URL
publications.rwth-aachen.de/oai2d
Last updated
2026-07-30
Source record
OAI-PMH GetRecord
related terms
citation

Stein, Josef. Niedertemperatur-Deposition von Siliziumdioxid mittels Remote-PECVD. Shaker, 1999. https://publications.rwth-aachen.de/record/55640

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