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Iowa State University

The growth of microcrystalline thin films using ECR-PECVD: Silicon and Silicon-Germanium

Degree

thesis:*
Name thesis:degree_name
Master of Science
Level thesis:degree_level
thesis
Discipline thesis:degree_discipline
Electrical Engineering
Department dc:contributor.department
Department of Electrical and Computer Engineering
Year dc:date.issued
2002

Author and committee

dc:creator, dc:contributor.*
Author dc:creator
  • Huh, Yung

Rights

Language dc:language.iso
en

Identifiers

dc:identifier.*
Identifier
archive/lib.dr.iastate.edu/rtd/19882/
OAI identifier oai:identifier
oai:dr.lib.iastate.edu:20.500.12876/97249

Chain of custody

source
Harvested from
Iowa State University
Base URL
dr.lib.iastate.edu/server/oai/request
Last updated
2026-07-24
Source record
OAI-PMH GetRecord
related terms
citation

Huh, Yung. The growth of microcrystalline thin films using ECR-PECVD: Silicon and Silicon-Germanium. thesis thesis, 2002. https://dr.lib.iastate.edu/handle/20.500.12876/97249