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Showing 1 to 20 of 47 for “"Interference Lithography"”.
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Submicron patterning using laser interference lithography
… nanopatterning technique called Interferometric Lithography (IL) are presented. Comprised of the identical process attributes of traditional projection photolithography, IL mirrors the wafer preparation and development procedures of our existing clean room capabilities. The main departure is …
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Interference lithography for optical devices and coatings
Interference lithography can create large-area, defect-free nanostructures with unique optical properties. In this thesis, interference lithography will be utilized to create photonic crystals for functional devices or coatings. For instance, typical lithographic processing techniques were used to …
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Nanostructuring magnetic thin films using interference lithography
… potentially fulfill this need. The technique of interference lithography is examined in the context of patterning ~100 nm size features. An interferometer is designed and built which will allow exposure of gratings and grids with a minimum spatial period of ~ 170 nm. Etching methods, especially …
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Toward nano-accuracy in scanning beam interference lithography
Scanning beam interference lithography is a technique developed in our laboratory which uses interfering beams and a scanning stage to rapidly pattern gratings over large areas (300x300 mm2) with high precision. The repeatability of the system [approx.] ±3 nm is an important precursor for obtaining …
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Multilevel interference lithography--fabricating sub-wavelength periodic nanostructures
… crystals, and templates for self-assembly. Interference lithography (IL) is an attractive method for fabricating such structures, as it offers several advantages including large exposure area and high spatial-phase coherence. However, the spatial resolution of IL is limited, and the smallest …
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Fabrication of Novel Three-Dimensional Photonic Crystals Using Multi-Beam Interference Lithography
… are demonstrated as a technique to design an interference lithography experiment. A four-beam setup with beams originating in opposite hemispheres and linear polarizations is found to generate a structure with diamond symmetry and a large complete photonic band gap. Band gap studies on …
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Computational Design of Interference Lithography for the Fabrication of Three-Dimensional Microstructures
… class of 3D microfabrication techniques, called interference lithography (IL), enables a wide variety of periodic microstructures through optical means. The focus of this work has been to develop and experimentally validate a computational approach to the design of IL experiments.
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Fabrication and Characterization of Three Dimensional Photonic Crystals Generated by Multibeam Interference Lithography
Multibeam interference lithography is investigated as a manufacturing technique for three-dimensional photonic crystal templates. In this research, optimization of the optical setup and the photoresist initiation system leads to a significant improvement of the optical quality of the crystal, as …
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Ultra-high precision scanning beam interference lithography and its application : spatial frequency multiplication
Scanning beam interference lithography (SBIL) is a technique developed at MIT in 2003. The SBIL system, referred to as the Nanoruler, could fabricate grating patterns with around ten-nanometer phase repeatability. There were many factors which limit its precision and thus limit its utility for …
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Beam alignment and image metrology for scanning beam interference lithography : fabricating gratings with nanometer phase accuracy
We are developing a scanning beam interference lithography (SBIL) system. SBIL is capable of producing large-area linear diffraction gratings that are phase-accurate to the nanometer level. Such gratings may enable new paradigms in fields such as semiconductor pattern placement metrology and …
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2D and 3D periodic templates through holographic interference lithography : photonic and phononic crystals and biomimetic microlens arrays
… for controlling structure via holographic interference lithography was established and implemented. Access to various space groups including such important structures as the level set approximations to the Diamond, the Schwartz P structure, the FCC, and the non centrosymmetric Gyroid …
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Design and analysis of a scanning beam interference lithography system for patterning gratings with nanometer-level distortions
… novel patterning method, termed scanning beam interference lithography (SBIL), uses the interference fringes between two coherent laser beams to define highly coherent gratings in photo resist. The substrate is step and scanned under the interference pattern to expose large gratings. Our …
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Breaking symmetries in ordered materials : spin polarized light transport in magnetized noncentrosymmetric 1D photonic crystals, and photonic gaps and fabrication of quasiperiodic structured materials from interference lithography
Effects of breaking various symmetries on optical properties in ordered materials have been studied. Photonic crystals lacking space-inversion and time-reversal symmetries were shown to display nonreciprocal dispersion relations, and to exhibit a remarkable set of symmetry-related properties. Even …
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On the development of a low-cost lithographic interferometer
Interference lithography is a technique for making one- and two-dimensional periodic nanostructures using interference of two coherent light beams. Despite their successes, the size, maintenance, and cost of interference lithography tools have prevented periodic nanostructures from being ubiquitous …
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On the design of lithographic interferometers and their application
Interference lithography is presented as an ideal technique for fabricating large-area periodic structures with sub-100nm dimensions. A variety of interferometer designs are discussed and implemented, each of which emphasizes a different attribute. Curvature of the substrate during exposures in a …
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Creation of 3-dimensional micro-optical materials
… here. Chapter 2 will be focused on multi-beam interference lithography, a technique whereby the interference pattern of beams of light is converted into a pattern of solid photoresist, often used to create photonic crystals. The mathematical relations between the interfering beams and the …
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Nanometer-scale placement in electron-beam lithography
Electron-beam lithography is capable of high-resolution lithographic pattern generation (down to 10 nm or below). However, for conventional e-beam lithography, pattern-placement accuracy is inferior to resolution. Despite significant efforts to improve pattern placement, a limit is being …
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Design and fabrication of novel and functional 3D structures via proximity field nano-patterning
… field Nano-Patterning (PnP) is a large-area interference lithography technique that is used to fabricate multi-dimensionally periodic micro-structures. Though a potent technique for 3D microfabrication that offers dual and superior advantage of scalable resolution and throughput, this …
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Potential technologies based on stamped periodic nanoparticle array
… array patterning technology integrating interference lithography, self assembly and soft lithography is assessed. This technology is capable of parallel patterning of nanoparticles at a large scale. Among several possible applications of this technology, potential for Deoxyribonucleic …
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INFLUENCE OF STRUCTURAL AND CHEMICAL ASYMMETRY OF NANOSTRUCTURES ON THE KINETICS OF WETTING
… by fabricating elliptical nanofins using interference lithography and metal assisted chemical etching. Chemically anisotropic nanostructures, on the other hand, were obtained by the oblique angle deposition of a metal onto an array of polystyrene nanostructures fabricated by interference …
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