Design and analysis of a scanning beam interference lithography system for patterning gratings with nanometer-level distortions

This thesis describes the design and analysis of a system for patterning large-area gratings with nanometer level phase distortions. The novel patterning method, termed scanning beam interference lithography (SBIL), uses the interference fringes between two coherent laser beams to define highly coherent gratings in photo resist. The substrate is step and scanned under the interference pattern to expose large gratings. Our experimental system, the "Nanoruler", employs interference lithography optics, an X-Y air bearing stage, column referencing displacement interferometry, refractometry, a grating length-scale reference, a beam alignment system, and acousto-optic fringe locking. Supporting systems also include an environmental enclosure, a beam steering system, and vibration isolation with feedforward. The system can pattern 300 mm diameter substrates. The errors are categorized and analyzed. The image-to-substrate motion during writing is comprised of "servo error", which is calculated from interferometric measurements, and unobservable error. The Nanoruler contains a built-in metrology capability where it can measure directly the image-to-substrate motions, which includes the unobservable error. In this special metrology mode, measurements can be performed at all substrate locations and on the fly - a capability possessed by no other patterning machine. This feature is used to assess the image-to-substrate motions. On-the-fly writing and metrology is further noted to be important because periodic errors in the interferometry can be eliminated. I control the fringe placement with a novel system of stage control and acousto-optic fringe locking. The experimentally verified system performance allows control of the servo error to the limits of quantization and latency.

Department dc:contributor.department

Massachusetts Institute of Technology. Dept. of Mechanical Engineering.

Grantor dc:publisher

Massachusetts Institute of Technology

Year dc:date.issued

2003

Author dc:creator

• Konkola, Paul Thomas, 1973-

Advisor dc:contributor.advisor

• Mark L. Schattenburg.

• Mechanical Engineering.

Statement dc:rights

• M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.

Licence dc:rights.uri

• http://dspace.mit.edu/handle/1721.1/7582

Language dc:language.iso

eng

Handle dc:identifier.uri

http://hdl.handle.net/1721.1/16958

OAI identifier oai:identifier

oai:dspace.mit.edu:1721.1/16958