Toward nano-accuracy in scanning beam interference lithography

Scanning beam interference lithography is a technique developed in our laboratory which uses interfering beams and a scanning stage to rapidly pattern gratings over large areas (300x300 mm2) with high precision. The repeatability of the system [approx.] ±3 nm is an important precursor for obtaining nanometer accuracy. The R&D award winning tool developed in our laboratory, referred to as the nanoruler, uses scanning beam interference lithography to pattern large gratings with periods on the order of 574 nm at velocities approaching 100 mm/s. In this thesis, I will present techniques which I developed to improve the accuracy of the nanoruler. These techniques include mirror mapping, which allows one to characterize the reference mirrors used for stage scanning. In addition, I will present characterization techniques which include translation and rotation tests to measure the distortion present in our system. In order to correct for the measured distortion, I have implemented an on the fly phase-lookup technique in which the phase of the interfering beams are modulated to correct for the system distortion. Several potential applications of this technology require not only high phase fidelity, but uniform linewidth as well.

Department dc:contributor.department

Massachusetts Institute of Technology. Dept. of Electrical Engineering and Computer Science.

Grantor dc:publisher

Massachusetts Institute of Technology

Year dc:date.issued

2006

Author dc:creator

• Montoya, Juan, 1976-

Advisor dc:contributor.advisor

• Mark Schattenburg.

• Electrical Engineering and Computer Science.

Statement dc:rights

• M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.

Licence dc:rights.uri

• http://dspace.mit.edu/handle/1721.1/7582

Language dc:language.iso

eng

Handle dc:identifier.uri

http://hdl.handle.net/1721.1/37909

OAI identifier oai:identifier

oai:dspace.mit.edu:1721.1/37909