Measurment of Process Plasma Parameters in a RF Capacitively Coupled Device

Made available in DSpace on 2017-07-06T18:59:27Z (GMT). No. of bitstreams: 3 Wilson_Jeffrey_L_MS.pdf: 81564240 bytes, checksum: bb11bb53dd8ef093afd430fddc29e9b1 (MD5) Wilson_Jeffrey_L_MS_ABS.pdf: 559103 bytes, checksum: 94f9ef64e77d3e783f5f215f4541bba4 (MD5) license.txt: 4813 bytes, checksum: 715c4321821a960fa1a1e91d2ac7ebce (MD5) Previous issue date: 1989

Name thesis:degree_name

M.S. (master's)

Level thesis:degree_level

Thesis

Discipline thesis:degree_discipline

Nuclear, Plasma, and Radiological Engineering

Year dc:date

2017

Author dc:creator

• Wilson, Jeffrey L.

• nuclear engineering
• process plasma parameters
• rf capacity coupled device
• beam component behavior
• Argon plasma

Statement dc:rights

• Copyright 2001 Bradley Lee Wescott

Language dc:language

en

Handle dc:identifier

http://hdl.handle.net/2142/96594

OAI identifier oai:identifier

oai:www.ideals.illinois.edu:2142/96594