Global ETD Search
Search theses and dissertations gathered from participating repositories worldwide. Every result links back to the library that holds it. No account is needed.
Results
Showing 1 to 1 of 1 for “"process plasma parameters"”.
-
Measurment of Process Plasma Parameters in a RF Capacitively Coupled Device
Made available in DSpace on 2017-07-06T18:59:27Z (GMT). No. of bitstreams: 3 Wilson_Jeffrey_L_MS.pdf: 81564240 bytes, checksum: bb11bb53dd8ef093afd430fddc29e9b1 (MD5) Wilson_Jeffrey_L_MS_ABS.pdf: 559103 bytes, checksum: 94f9ef64e77d3e783f5f215f4541bba4 (MD5) license.txt: 4813 bytes, checksum: …