Diagnostics for ionized physical vapor deposition chambers

As the critical dimension of the semiconductor device continues to shrink and aspect ratio continues to rise, more diagnostics are needed to accurately predict the deposition profile of features on the wafer. Traditionally, the incident ion fluxes are considered to be perfectly normal to the wafer plane due to the electric field of the plasma sheath. However from simulation results the ion flux from a magnetron discharge has a narrow angular distribution and this distribution is becoming more significant as the aspect ratio increases. In order to confirm and adjust this predicted distribution a sensor to measure angular distribution of ions in an industrial scale chamber is designed and developed. The sensor is a combined gridded energy analyzer (GEA) and a quartz crystal microbalance (QCM), with a high aspect ratio collimator in place of the normal electron repeller grid for angular measurement distribution measurements. The collimator is made of copper elements with 500μm nominal openings which provides 1 degree angular resolution. This combined QCM and GEA setup is capable to determine fluxes of metal ions, metal atoms and argon ions at 30kW DC magnetron nominal target power. The setup is able to tilt around 10 degrees about the wafer plane in 1 degree intervals and measure the angular distribution of the ion and neutral fluxes generated by the discharge.

Name thesis:degree_name

Ph.D.

Level thesis:degree_level

Dissertation

Discipline thesis:degree_discipline

Nuclear, Plasma, Radiolgc Engr

Grantor

University of Illinois at Urbana-Champaign

Year dc:date

2016

Author dc:creator

• Wu, Yuilun

Contributors dc:contributor

• Ruzic, David N.
• Eden, James G.
• Allain, Jean P.
• Brooks, Caleb S.

• Physical vapor deposition
• Angular distribution
• Deposition profile
• Ion and neutral fluxes
• Quartz crystal microbalance (QCM)
• Gridded energy analyzer (GEA)

Statement dc:rights

• Copyright 2016 Yui Lun Wu

Language dc:language

en

Handle dc:identifier

http://hdl.handle.net/2142/92922

OAI identifier oai:identifier

oai:www.ideals.illinois.edu:2142/92922