{"id":{"repo_id":"uiuc","oai_identifier":"oai:www.ideals.illinois.edu:2142/92922"},"canonical_url":"https://search.dev.ndltd.org/etd/uiuc/oai:www.ideals.illinois.edu:2142/92922","repository":{"repo_id":"uiuc","name":"University of Illinois - Urbana-Champaign","base_url":"https://www.ideals.illinois.edu/oai-pmh"},"display":{"title":"Diagnostics for ionized physical vapor deposition chambers","abstract":"As the critical dimension of the semiconductor device continues to shrink and aspect ratio continues to rise, more diagnostics are needed to accurately predict the deposition profile of features on the wafer. Traditionally, the incident ion fluxes are considered to be perfectly normal to the wafer plane due to the electric field of the plasma sheath. However from simulation results the ion flux from a magnetron discharge has a narrow angular distribution and this distribution is becoming more significant as the aspect ratio increases. In order to confirm and adjust this predicted distribution a sensor to measure angular distribution of ions in an industrial scale chamber is designed and developed. The sensor is a combined gridded energy analyzer (GEA) and a quartz crystal microbalance (QCM), with a high aspect ratio collimator in place of the normal electron repeller grid for angular measurement distribution measurements. The collimator is made of copper elements with 500μm nominal openings which provides 1 degree angular resolution. This combined QCM and GEA setup is capable to determine fluxes of metal ions, metal atoms and argon ions at 30kW DC magnetron nominal target power. The setup is able to tilt around 10 degrees about the wafer plane in 1 degree intervals and measure the angular distribution of the ion and neutral fluxes generated by the discharge.","abstract_html":"As the critical dimension of the semiconductor device continues to shrink and aspect ratio continues to rise, more diagnostics are needed to accurately predict the deposition profile of features on the wafer. Traditionally, the incident ion fluxes are considered to be perfectly normal to the wafer plane due to the electric field of the plasma sheath. However from simulation results the ion flux from a magnetron discharge has a narrow angular distribution and this distribution is becoming more significant as the aspect ratio increases. In order to confirm and adjust this predicted distribution a sensor to measure angular distribution of ions in an industrial scale chamber is designed and developed. The sensor is a combined gridded energy analyzer (GEA) and a quartz crystal microbalance (QCM), with a high aspect ratio collimator in place of the normal electron repeller grid for angular measurement distribution measurements. The collimator is made of copper elements with 500μm nominal openings which provides 1 degree angular resolution. This combined QCM and GEA setup is capable to determine fluxes of metal ions, metal atoms and argon ions at 30kW DC magnetron nominal target power. The setup is able to tilt around 10 degrees about the wafer plane in 1 degree intervals and measure the angular distribution of the ion and neutral fluxes generated by the discharge.","abstract_has_math":false,"creators":["Wu, Yuilun"],"institution":"University of Illinois at Urbana-Champaign","degree_name":"Ph.D.","degree_level":"Dissertation","degree_discipline":"Nuclear, Plasma, Radiolgc Engr","degree_department":null,"school":null,"contributors":["Ruzic, David N.","Eden, James G.","Allain, Jean P.","Brooks, Caleb S."],"advisors":[],"committee_chairs":[],"committee_members":[],"year":2016,"date_issued":"2016-11-10T18:27:40Z","date_published":"2016-11-10T18:27:40Z","updated_at":"2026-07-22T22:26:35Z","subjects":["Physical vapor deposition","Angular distribution","Deposition profile","Ion and neutral fluxes","Quartz crystal microbalance (QCM)","Gridded energy analyzer (GEA)"],"languages":["en"],"rights":["Copyright 2016 Yui Lun Wu"],"rights_urls":[],"identifier_entries":[]},"links":{"outbound_url":"http://hdl.handle.net/2142/92922","outbound_label":"Handle","outbound_source":"dc:identifier"},"metadata_groups":[{"id":"people","label":"People","entries":[{"key":"dc:contributor","label":"Contributor","values":["Ruzic, David N.","Eden, James G.","Allain, Jean P.","Brooks, Caleb S."]},{"key":"dc:creator","label":"Author","values":["Wu, Yuilun"]}]},{"id":"academic_context","label":"Academic Context","entries":[{"key":"dc:date","label":"Dc Date","values":["2016-11-10T18:27:40Z","2020-03-19T09:15:16Z","2016-07-08","2016-08"]},{"key":"dc:type","label":"Dc Type","values":["text"]},{"key":"thesis:degree_discipline","label":"Discipline","values":["Nuclear, Plasma, Radiolgc Engr"]},{"key":"thesis:degree_level","label":"Degree Level","values":["Dissertation"]},{"key":"thesis:degree_name","label":"Degree Name","values":["Ph.D."]},{"key":"thesis:institution_name","label":"Thesis Institution Name","values":["University of Illinois at Urbana-Champaign"]}]},{"id":"subjects_keywords","label":"Subjects and Keywords","entries":[{"key":"dc:subject","label":"Dc Subject","values":["Physical vapor deposition","Angular distribution","Deposition profile","Ion and neutral fluxes","Quartz crystal microbalance (QCM)","Gridded energy analyzer (GEA)"]}]},{"id":"language_rights","label":"Language and Rights","entries":[{"key":"dc:language","label":"Dc Language","values":["en"]},{"key":"dc:rights","label":"Dc Rights","values":["Copyright 2016 Yui Lun Wu"]}]},{"id":"identifiers","label":"Identifiers","entries":[{"key":"dc:identifier","label":"Identifier","values":["http://hdl.handle.net/2142/92922"]}]},{"id":"additional","label":"Additional Metadata","entries":[{"key":"dc:description","label":"Description","values":["As the critical dimension of the semiconductor device continues to shrink and aspect ratio continues to rise, more diagnostics are needed to accurately predict the deposition profile of features on the wafer. Traditionally, the incident ion fluxes are considered to be perfectly normal to the wafer plane due to the electric field of the plasma sheath. However from simulation results the ion flux from a magnetron discharge has a narrow angular distribution and this distribution is becoming more significant as the aspect ratio increases. In order to confirm and adjust this predicted distribution a sensor to measure angular distribution of ions in an industrial scale chamber is designed and developed. The sensor is a combined gridded energy analyzer (GEA) and a quartz crystal microbalance (QCM), with a high aspect ratio collimator in place of the normal electron repeller grid for angular measurement distribution measurements. The collimator is made of copper elements with 500μm nominal openings which provides 1 degree angular resolution. This combined QCM and GEA setup is capable to determine fluxes of metal ions, metal atoms and argon ions at 30kW DC magnetron nominal target power. The setup is able to tilt around 10 degrees about the wafer plane in 1 degree intervals and measure the angular distribution of the ion and neutral fluxes generated by the discharge.","Submission published under a 24 month embargo labeled 'Closed Access', the embargo will last until 2018-08-01","The student, Yuilun Wu, accepted the attached license on 2016-07-05 at 17:18.","The student, Yuilun Wu, submitted this Dissertation for approval on 2016-07-05 at 17:28.","This Dissertation was approved for publication on 2016-07-08 at 09:13.","DSpace SAF Submission Ingestion Package generated from Vireo submission #9765 on 2016-11-10 at 12:20:14","Made available in DSpace on 2016-11-10T18:27:40Z (GMT). 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Traditionally, the incident ion fluxes are considered to be perfectly normal to the wafer plane due to the electric field of the plasma sheath. However from simulation results the ion flux from a magnetron discharge has a narrow angular distribution and this distribution is becoming more significant as the aspect ratio increases. In order to confirm and adjust this predicted distribution a sensor to measure angular distribution of ions in an industrial scale chamber is designed and developed. The sensor is a combined gridded energy analyzer (GEA) and a quartz crystal microbalance (QCM), with a high aspect ratio collimator in place of the normal electron repeller grid for angular measurement distribution measurements. The collimator is made of copper elements with 500μm nominal openings which provides 1 degree angular resolution. This combined QCM and GEA setup is capable to determine fluxes of metal ions, metal atoms and argon ions at 30kW DC magnetron nominal target power. The setup is able to tilt around 10 degrees about the wafer plane in 1 degree intervals and measure the angular distribution of the ion and neutral fluxes generated by the discharge.","Submission published under a 24 month embargo labeled 'Closed Access', the embargo will last until 2018-08-01","The student, Yuilun Wu, accepted the attached license on 2016-07-05 at 17:18.","The student, Yuilun Wu, submitted this Dissertation for approval on 2016-07-05 at 17:28.","This Dissertation was approved for publication on 2016-07-08 at 09:13.","DSpace SAF Submission Ingestion Package generated from Vireo submission #9765 on 2016-11-10 at 12:20:14","Made available in DSpace on 2016-11-10T18:27:40Z (GMT). No. of bitstreams: 2 WU-DISSERTATION-2016.pdf: 7446178 bytes, checksum: fec472a50097cb0f2ecda89208a62a91 (MD5) LICENSE.txt: 4206 bytes, checksum: c0745ebd433aecf36767e36cb80c1add (MD5) Previous issue date: 2016-07-08","Embargo set by: Seth Robbins for item 95342 Lift date: 2018-11-10T18:28:02Z Reason: Author requested closed access (OA after 2yrs) in Vireo ETD system","U of I Only Restriction set for Item 95342 on 2018-03-19T17:00:22Z with date 2018-11-10 by nrhodes3@illinois.edu.","U of I Only Restriction set for Item 95342 on 2018-03-19T17:01:23Z with date 2020-03-19 by nrhodes3@illinois.edu.","U of I Only Restriction set for Item 95342 on 2018-03-19T17:01:41Z with date 2020-03-19 by nrhodes3@illinois.edu.","U of I Only Restriction Lifted for Item 95342 on 2020-03-19T09:15:16Z."],"dc:format":["application/pdf"],"dc:identifier":["http://hdl.handle.net/2142/92922"],"dc:language":["en"],"dc:rights":["Copyright 2016 Yui Lun Wu"],"dc:subject":["Physical vapor deposition","Angular distribution","Deposition profile","Ion and neutral fluxes","Quartz crystal microbalance (QCM)","Gridded energy analyzer (GEA)"],"dc:title":["Diagnostics for ionized physical vapor deposition chambers"],"dc:type":["text"],"thesis:degree_discipline":["Nuclear, Plasma, Radiolgc Engr"],"thesis:degree_level":["Dissertation"],"thesis:degree_name":["Ph.D."],"thesis:institution_name":["University of Illinois at Urbana-Champaign"]},"updated_at":"2026-07-22T22:26:35Z"}