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University of Illinois at Urbana-Champaign
Transition Metal Hydroborate Complexes: Structures, Syntheses, and Use as Chemical Vapor Deposition Precursors
Abstract
dc:descriptionPassage of Zr(BH4)4 over heated substrates with a coincident flux of H atoms gives adhesive, mirror-bright films at a growth rate of 60 A/min. These films are smooth on the nanometer scale and possess electrical resistivities as low as 45 muO-cm. The films are free of carbon and have low concentrations of oxygen (∼4 at. %). Deposition at 150°C achieves films of formula ZrB1.8O 0.1. In contrast, films grown under purely thermal conditions or by other plasma-assisted methods have boron-to-metal ratios near 3:1 and oxidize readily in air.
Degree
thesis:*- Name thesis:degree_name
- Ph.D.
- Level thesis:degree_level
- Dissertation
- Discipline thesis:degree_discipline
- Chemistry
- Grantor
- University of Illinois at Urbana-Champaign
- Year dc:date
- 2015
Author and committee
dc:creator, dc:contributor.*- Author dc:creator
-
- Goedde, Dean Matthew
- Contributors dc:contributor
-
- Girolami, Gregory S.
Subjects
dc:subject × 1Rights
- Language dc:language
- eng
Identifiers
dc:identifier.*- Identifier
- (MiAaPQ)AAI3017083
- OAI identifier oai:identifier
- oai:www.ideals.illinois.edu:2142/84023