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University of Illinois at Urbana-Champaign

Compliant Meso-Scale Grinding of Silicon

Abstract

dc:description

To further improve form accuracy obtained on the compliant grinding apparatus, a normal grinding force model and a depth of cut model were developed to account for the large compliance in the grinding system. Numerical simulation was performed to predict actual depths of cut and the results were within 6% of the measured/actual depths.

Degree

thesis:*
Name thesis:degree_name
Ph.D.
Level thesis:degree_level
Dissertation
Discipline thesis:degree_discipline
Mechanical Engineering
Grantor
University of Illinois at Urbana-Champaign
Year dc:date
2015

Author and committee

dc:creator, dc:contributor.*
Author dc:creator
  • Jiang, Bo
Contributors dc:contributor
  • Philpott, Michael L.
  • Shannon, Mark A.

Subjects

dc:subject × 1

Rights

Language dc:language
eng

Identifiers

dc:identifier.*
Identifier
(MiAaPQ)AAI3153333
OAI identifier oai:identifier
oai:www.ideals.illinois.edu:2142/83813

Chain of custody

source
Harvested from
University of Illinois - Urbana-Champaign
Base URL
www.ideals.illinois.edu/oai-pmh
Last updated
2026-07-22
Source record
OAI-PMH GetRecord
citation

Jiang, Bo. Compliant Meso-Scale Grinding of Silicon. Dissertation thesis, University of Illinois at Urbana-Champaign, 2015. http://hdl.handle.net/2142/83813