Surface Reaction Mechanisms in Plasma Etching Processes

Surface reactions occurring in fluorocarbon plasmas also influence plasma properties by consuming or generating plasma fluxes. Of particular interest is the effect that surfaces have on CF2 densities, as CF2 is a precursor for polymer formation. These processes were investigated with the integrated plasma-surface model. Simulations demonstrated that CF 2 self-sticking is a loss at the surface, while ion sputtering and large ion dissociation can generate CF2 at surfaces. The net effect of the surface depends on the relative magnitudes of the loss and generation reactions.

Name thesis:degree_name

Ph.D.

Level thesis:degree_level

Dissertation

Discipline thesis:degree_discipline

Materials Science and Engineering

Grantor

University of Illinois at Urbana-Champaign

Year dc:date

2015

Author dc:creator

• Zhang, Da

Contributors dc:contributor

• Kushner, Mark J.

• Engineering, Chemical

Language dc:language

eng

Identifier

(MiAaPQ)AAI9990206

OAI identifier oai:identifier

oai:www.ideals.illinois.edu:2142/82937