Nanostructural, Surface Morphological Evolution, and Physical Properties of Sodium Chloride-Structure Titanium Nitride and Titanium Cerium Nitride Layers as a Function of Composition

I use a combination of alloying and low-energy ion irradiation during film growth to controllably manipulate the nanostructure of TiN-based layers. Ti0.8Ce0.2N films are grown on oxidized Si(001) at 350°C using UHV reactive magnetron sputter deposition in pure N2. The N+2 to metal ratio incident at the growing film is maintained constant at 15 while the ion energy EN+2 is varied from 14 to 45 eV. Films grown with EN+2 = 14 eV consist of equiaxed nanograins with an average size of 2.0 nm while layers deposited with EN+2 = 45 eV exhibit a 2-nm-wide nanocolumnar structure. In both cases, the films are dense, atomically smooth, and have strong 002 preferred orientation with low stress.

Name thesis:degree_name

Ph.D.

Level thesis:degree_level

Dissertation

Discipline thesis:degree_discipline

Materials Science and Engineering

Grantor

University of Illinois at Urbana-Champaign

Year dc:date

2015

Author dc:creator

• Lee, Tae-Yoon

Contributors dc:contributor

• Greene, Joseph E.

• Physics, Condensed Matter

Language dc:language

eng

Identifier

(MiAaPQ)AAI3160913

OAI identifier oai:identifier

oai:www.ideals.illinois.edu:2142/82756