Fabrication of Metal and Organic Nanostructures on Silicon(100) With Scanning Tunneling Microscope-Based Lithography

"The scanning tunneling microscope (STM) has been employed for both atomic-scale characterization and modification of surfaces. The STM, for example, can be used to desorb hydrogen or deuterium from nanometer-sized regions of the H-passivated or D-passivated Si(100)-2 x 1 surface, resulting in nanometer-sized ""templates"" which can then be reacted with various chemical species. Previous work has demonstrated selective oxidation and nitridation of STM- patterned areas by exposing the patterned surface to O2 and NH3, respectively. Here, this technique is applied to the fabrication of organic and metal-containing nanostructures on the Si(100) surface. Norbornadiene, an olefinic organic molecule, is shown to react selectively with STM-depassivated areas to form nanometer-sized regions with a norbornadiene adlayer. Metal CVD (chemical vapor deposition) precursor molecules are also shown to react selectively with STM-depassivated areas. The reaction of such areas with an Al CVD precursor and with a CVD nucleation promoter (TiCl4) is discussed, and preliminary results with other metal precursor molecules are described."

Name thesis:degree_name

Ph.D.

Level thesis:degree_level

Dissertation

Discipline thesis:degree_discipline

Electrical Engineering

Grantor

University of Illinois at Urbana-Champaign

Year dc:date

1998

Author dc:creator

• Abeln, Glenn Charles

Contributors dc:contributor

• Lyding, Joseph W.

• Engineering, Materials Science

Language dc:language

eng

Identifier

(MiAaPQ)AAI9912182

OAI identifier oai:identifier

oai:www.ideals.illinois.edu:2142/81257