{"id":{"repo_id":"uiuc","oai_identifier":"oai:www.ideals.illinois.edu:2142/81257"},"canonical_url":"https://search.dev.ndltd.org/etd/uiuc/oai:www.ideals.illinois.edu:2142/81257","repository":{"repo_id":"uiuc","name":"University of Illinois - Urbana-Champaign","base_url":"https://www.ideals.illinois.edu/oai-pmh"},"display":{"title":"Fabrication of Metal and Organic Nanostructures on Silicon(100) With Scanning Tunneling Microscope-Based Lithography","abstract":"\"The scanning tunneling microscope (STM) has been employed for both atomic-scale characterization and modification of surfaces. The STM, for example, can be used to desorb hydrogen or deuterium from nanometer-sized regions of the H-passivated or D-passivated Si(100)-2 x 1 surface, resulting in nanometer-sized \"\"templates\"\" which can then be reacted with various chemical species. Previous work has demonstrated selective oxidation and nitridation of STM- patterned areas by exposing the patterned surface to O2 and NH3, respectively. Here, this technique is applied to the fabrication of organic and metal-containing nanostructures on the Si(100) surface. Norbornadiene, an olefinic organic molecule, is shown to react selectively with STM-depassivated areas to form nanometer-sized regions with a norbornadiene adlayer. Metal CVD (chemical vapor deposition) precursor molecules are also shown to react selectively with STM-depassivated areas. The reaction of such areas with an Al CVD precursor and with a CVD nucleation promoter (TiCl4) is discussed, and preliminary results with other metal precursor molecules are described.\"","abstract_html":""The scanning tunneling microscope (STM) has been employed for both atomic-scale characterization and modification of surfaces. The STM, for example, can be used to desorb hydrogen or deuterium from nanometer-sized regions of the H-passivated or D-passivated Si(100)-2 x 1 surface, resulting in nanometer-sized ""templates"" which can then be reacted with various chemical species. Previous work has demonstrated selective oxidation and nitridation of STM- patterned areas by exposing the patterned surface to O2 and NH3, respectively. Here, this technique is applied to the fabrication of organic and metal-containing nanostructures on the Si(100) surface. Norbornadiene, an olefinic organic molecule, is shown to react selectively with STM-depassivated areas to form nanometer-sized regions with a norbornadiene adlayer. Metal CVD (chemical vapor deposition) precursor molecules are also shown to react selectively with STM-depassivated areas. The reaction of such areas with an Al CVD precursor and with a CVD nucleation promoter (TiCl4) is discussed, and preliminary results with other metal precursor molecules are described."","abstract_has_math":false,"creators":["Abeln, Glenn Charles"],"institution":"University of Illinois at Urbana-Champaign","degree_name":"Ph.D.","degree_level":"Dissertation","degree_discipline":"Electrical Engineering","degree_department":null,"school":null,"contributors":["Lyding, Joseph W."],"advisors":[],"committee_chairs":[],"committee_members":[],"year":1998,"date_issued":"1998","date_published":"1998","updated_at":"2026-07-22T22:26:15Z","subjects":["Engineering, Materials Science"],"languages":["eng"],"rights":[],"rights_urls":[],"identifier_entries":[{"key":"dc:identifier","label":"Identifier","values":["(MiAaPQ)AAI9912182"],"render_values":[{"text":"(MiAaPQ)AAI9912182","href":null,"code":true}]}]},"links":{"outbound_url":"http://hdl.handle.net/2142/81257","outbound_label":"Handle","outbound_source":"dc:identifier"},"metadata_groups":[{"id":"people","label":"People","entries":[{"key":"dc:contributor","label":"Contributor","values":["Lyding, Joseph W."]},{"key":"dc:creator","label":"Author","values":["Abeln, Glenn Charles"]}]},{"id":"academic_context","label":"Academic Context","entries":[{"key":"dc:date","label":"Dc Date","values":["1998","2015-09-25T20:10:17Z","10000-01-01"]},{"key":"dc:type","label":"Dc Type","values":["text"]},{"key":"thesis:degree_discipline","label":"Discipline","values":["Electrical Engineering"]},{"key":"thesis:degree_level","label":"Degree Level","values":["Dissertation"]},{"key":"thesis:degree_name","label":"Degree Name","values":["Ph.D."]},{"key":"thesis:institution_name","label":"Thesis Institution Name","values":["University of Illinois at Urbana-Champaign"]}]},{"id":"subjects_keywords","label":"Subjects and Keywords","entries":[{"key":"dc:subject","label":"Dc Subject","values":["Engineering, Materials Science"]}]},{"id":"language_rights","label":"Language and Rights","entries":[{"key":"dc:language","label":"Dc Language","values":["eng"]}]},{"id":"identifiers","label":"Identifiers","entries":[{"key":"dc:identifier","label":"Identifier","values":["http://hdl.handle.net/2142/81257","(MiAaPQ)AAI9912182"]}]},{"id":"additional","label":"Additional Metadata","entries":[{"key":"dc:description","label":"Description","values":["\"The scanning tunneling microscope (STM) has been employed for both atomic-scale characterization and modification of surfaces. The STM, for example, can be used to desorb hydrogen or deuterium from nanometer-sized regions of the H-passivated or D-passivated Si(100)-2 x 1 surface, resulting in nanometer-sized \"\"templates\"\" which can then be reacted with various chemical species. Previous work has demonstrated selective oxidation and nitridation of STM- patterned areas by exposing the patterned surface to O2 and NH3, respectively. Here, this technique is applied to the fabrication of organic and metal-containing nanostructures on the Si(100) surface. Norbornadiene, an olefinic organic molecule, is shown to react selectively with STM-depassivated areas to form nanometer-sized regions with a norbornadiene adlayer. Metal CVD (chemical vapor deposition) precursor molecules are also shown to react selectively with STM-depassivated areas. The reaction of such areas with an Al CVD precursor and with a CVD nucleation promoter (TiCl4) is discussed, and preliminary results with other metal precursor molecules are described.\"","Made available in DSpace on 2015-09-25T20:10:17Z (GMT). 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The STM, for example, can be used to desorb hydrogen or deuterium from nanometer-sized regions of the H-passivated or D-passivated Si(100)-2 x 1 surface, resulting in nanometer-sized \"\"templates\"\" which can then be reacted with various chemical species. Previous work has demonstrated selective oxidation and nitridation of STM- patterned areas by exposing the patterned surface to O2 and NH3, respectively. Here, this technique is applied to the fabrication of organic and metal-containing nanostructures on the Si(100) surface. Norbornadiene, an olefinic organic molecule, is shown to react selectively with STM-depassivated areas to form nanometer-sized regions with a norbornadiene adlayer. Metal CVD (chemical vapor deposition) precursor molecules are also shown to react selectively with STM-depassivated areas. The reaction of such areas with an Al CVD precursor and with a CVD nucleation promoter (TiCl4) is discussed, and preliminary results with other metal precursor molecules are described.\"","Made available in DSpace on 2015-09-25T20:10:17Z (GMT). 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