Stochastic Space-Charge in Projection Electron Lithography and High Resolution Transmission Electron Microscopy

The effects of space-charge have been investigated for the past half-century; the longevity of this research stems from the difficulty of the problem and from the technological advances which have availed new opportunities in which to study the phenomena. This thesis investigates a specific effect, the degradation in image resolution, as observed in two advanced technologies: SCattering with Angular Limitation Projection Electron Lithography (SCALPEL) and High-Resolution Transmission Electron Microscopy (HRTEM). These particular technologies were chosen for their technological relevance and their distinct mechanisms of image formation--SCALPEL exploits amplitude contrast while HRTEM exploits phase contrast. To provide insights into the occurring space-charge physics in both technologies, this thesis uses analytical modeling, Monte Carlo simulations and experimental techniques. Using these techniques, an approximation based on the nearest neighbor (NN) is developed, and its applicability to each system is presented. The NN predictions are compared to existing theories. Furthermore, design considerations and fundamental limitations for each technique are discussed. Lastly, future research directions are suggested.

Name thesis:degree_name

Ph.D.

Level thesis:degree_level

Dissertation

Discipline thesis:degree_discipline

Physics

Grantor

University of Illinois at Urbana-Champaign

Year dc:date

2015

Author dc:creator

• Schwartz, Adam Micah

Contributors dc:contributor

• Gibson, J. Murray

• Physics, Condensed Matter

Language dc:language

eng

Identifier

(MiAaPQ)AAI9834739

OAI identifier oai:identifier

oai:www.ideals.illinois.edu:2142/80654