{"id":{"repo_id":"uiuc","oai_identifier":"oai:www.ideals.illinois.edu:2142/80654"},"canonical_url":"https://search.dev.ndltd.org/etd/uiuc/oai:www.ideals.illinois.edu:2142/80654","repository":{"repo_id":"uiuc","name":"University of Illinois - Urbana-Champaign","base_url":"https://www.ideals.illinois.edu/oai-pmh"},"display":{"title":"Stochastic Space-Charge in Projection Electron Lithography and High Resolution Transmission Electron Microscopy","abstract":"The effects of space-charge have been investigated for the past half-century; the longevity of this research stems from the difficulty of the problem and from the technological advances which have availed new opportunities in which to study the phenomena. This thesis investigates a specific effect, the degradation in image resolution, as observed in two advanced technologies: SCattering with Angular Limitation Projection Electron Lithography (SCALPEL) and High-Resolution Transmission Electron Microscopy (HRTEM). These particular technologies were chosen for their technological relevance and their distinct mechanisms of image formation--SCALPEL exploits amplitude contrast while HRTEM exploits phase contrast. To provide insights into the occurring space-charge physics in both technologies, this thesis uses analytical modeling, Monte Carlo simulations and experimental techniques. Using these techniques, an approximation based on the nearest neighbor (NN) is developed, and its applicability to each system is presented. The NN predictions are compared to existing theories. Furthermore, design considerations and fundamental limitations for each technique are discussed. Lastly, future research directions are suggested.","abstract_html":"The effects of space-charge have been investigated for the past half-century; the longevity of this research stems from the difficulty of the problem and from the technological advances which have availed new opportunities in which to study the phenomena. This thesis investigates a specific effect, the degradation in image resolution, as observed in two advanced technologies: SCattering with Angular Limitation Projection Electron Lithography (SCALPEL) and High-Resolution Transmission Electron Microscopy (HRTEM). These particular technologies were chosen for their technological relevance and their distinct mechanisms of image formation--SCALPEL exploits amplitude contrast while HRTEM exploits phase contrast. To provide insights into the occurring space-charge physics in both technologies, this thesis uses analytical modeling, Monte Carlo simulations and experimental techniques. Using these techniques, an approximation based on the nearest neighbor (NN) is developed, and its applicability to each system is presented. The NN predictions are compared to existing theories. Furthermore, design considerations and fundamental limitations for each technique are discussed. Lastly, future research directions are suggested.","abstract_has_math":false,"creators":["Schwartz, Adam Micah"],"institution":"University of Illinois at Urbana-Champaign","degree_name":"Ph.D.","degree_level":"Dissertation","degree_discipline":"Physics","degree_department":null,"school":null,"contributors":["Gibson, J. Murray"],"advisors":[],"committee_chairs":[],"committee_members":[],"year":2015,"date_issued":"2015-09-25T20:03:28Z","date_published":"2015-09-25T20:03:28Z","updated_at":"2026-07-22T22:26:14Z","subjects":["Physics, Condensed Matter"],"languages":["eng"],"rights":[],"rights_urls":[],"identifier_entries":[{"key":"dc:identifier","label":"Identifier","values":["(MiAaPQ)AAI9834739"],"render_values":[{"text":"(MiAaPQ)AAI9834739","href":null,"code":true}]}]},"links":{"outbound_url":"http://hdl.handle.net/2142/80654","outbound_label":"Handle","outbound_source":"dc:identifier"},"metadata_groups":[{"id":"people","label":"People","entries":[{"key":"dc:contributor","label":"Contributor","values":["Gibson, J. Murray"]},{"key":"dc:creator","label":"Author","values":["Schwartz, Adam Micah"]}]},{"id":"academic_context","label":"Academic Context","entries":[{"key":"dc:date","label":"Dc Date","values":["2015-09-25T20:03:28Z","10000-01-01","1998"]},{"key":"dc:type","label":"Dc Type","values":["text"]},{"key":"thesis:degree_discipline","label":"Discipline","values":["Physics"]},{"key":"thesis:degree_level","label":"Degree Level","values":["Dissertation"]},{"key":"thesis:degree_name","label":"Degree Name","values":["Ph.D."]},{"key":"thesis:institution_name","label":"Thesis Institution Name","values":["University of Illinois at Urbana-Champaign"]}]},{"id":"subjects_keywords","label":"Subjects and Keywords","entries":[{"key":"dc:subject","label":"Dc Subject","values":["Physics, Condensed Matter"]}]},{"id":"language_rights","label":"Language and Rights","entries":[{"key":"dc:language","label":"Dc Language","values":["eng"]}]},{"id":"identifiers","label":"Identifiers","entries":[{"key":"dc:identifier","label":"Identifier","values":["http://hdl.handle.net/2142/80654","(MiAaPQ)AAI9834739"]}]},{"id":"additional","label":"Additional Metadata","entries":[{"key":"dc:description","label":"Description","values":["The effects of space-charge have been investigated for the past half-century; the longevity of this research stems from the difficulty of the problem and from the technological advances which have availed new opportunities in which to study the phenomena. This thesis investigates a specific effect, the degradation in image resolution, as observed in two advanced technologies: SCattering with Angular Limitation Projection Electron Lithography (SCALPEL) and High-Resolution Transmission Electron Microscopy (HRTEM). These particular technologies were chosen for their technological relevance and their distinct mechanisms of image formation--SCALPEL exploits amplitude contrast while HRTEM exploits phase contrast. To provide insights into the occurring space-charge physics in both technologies, this thesis uses analytical modeling, Monte Carlo simulations and experimental techniques. Using these techniques, an approximation based on the nearest neighbor (NN) is developed, and its applicability to each system is presented. The NN predictions are compared to existing theories. Furthermore, design considerations and fundamental limitations for each technique are discussed. Lastly, future research directions are suggested.","Made available in DSpace on 2015-09-25T20:03:28Z (GMT). No. of bitstreams: 2 license.txt: 4848 bytes, checksum: 96035ab3f5e1c23cc7138a224ce498bd (MD5) 9834739.pdf: 4983097 bytes, checksum: c6beae273d7f14a2e2e7e4ef92d45f32 (MD5) Previous issue date: 1998","Embargo set by: Seth Robbins for item 81936 Lift date: Forever Reason: Restricted to the U of I community idenfinitely during batch ingest of legacy ETDs","Restricted to the U of I community idenfinitely during batch ingest of legacy ETDs","U of I Only","120 p.","Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 1998."]},{"key":"dc:title","label":"Title","values":["Stochastic Space-Charge in Projection Electron Lithography and High Resolution Transmission Electron Microscopy"]}]}],"canonical_facts":{"dc:contributor":["Gibson, J. Murray"],"dc:creator":["Schwartz, Adam Micah"],"dc:date":["2015-09-25T20:03:28Z","10000-01-01","1998"],"dc:description":["The effects of space-charge have been investigated for the past half-century; the longevity of this research stems from the difficulty of the problem and from the technological advances which have availed new opportunities in which to study the phenomena. This thesis investigates a specific effect, the degradation in image resolution, as observed in two advanced technologies: SCattering with Angular Limitation Projection Electron Lithography (SCALPEL) and High-Resolution Transmission Electron Microscopy (HRTEM). These particular technologies were chosen for their technological relevance and their distinct mechanisms of image formation--SCALPEL exploits amplitude contrast while HRTEM exploits phase contrast. To provide insights into the occurring space-charge physics in both technologies, this thesis uses analytical modeling, Monte Carlo simulations and experimental techniques. Using these techniques, an approximation based on the nearest neighbor (NN) is developed, and its applicability to each system is presented. The NN predictions are compared to existing theories. Furthermore, design considerations and fundamental limitations for each technique are discussed. Lastly, future research directions are suggested.","Made available in DSpace on 2015-09-25T20:03:28Z (GMT). No. of bitstreams: 2 license.txt: 4848 bytes, checksum: 96035ab3f5e1c23cc7138a224ce498bd (MD5) 9834739.pdf: 4983097 bytes, checksum: c6beae273d7f14a2e2e7e4ef92d45f32 (MD5) Previous issue date: 1998","Embargo set by: Seth Robbins for item 81936 Lift date: Forever Reason: Restricted to the U of I community idenfinitely during batch ingest of legacy ETDs","Restricted to the U of I community idenfinitely during batch ingest of legacy ETDs","U of I Only","120 p.","Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 1998."],"dc:identifier":["http://hdl.handle.net/2142/80654","(MiAaPQ)AAI9834739"],"dc:language":["eng"],"dc:subject":["Physics, Condensed Matter"],"dc:title":["Stochastic Space-Charge in Projection Electron Lithography and High Resolution Transmission Electron Microscopy"],"dc:type":["text"],"thesis:degree_discipline":["Physics"],"thesis:degree_level":["Dissertation"],"thesis:degree_name":["Ph.D."],"thesis:institution_name":["University of Illinois at Urbana-Champaign"]},"updated_at":"2026-07-22T22:26:14Z"}