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University of Illinois at Urbana-Champaign
Novel Reactions on Halogen -Terminated Si(100)
Abstract
dc:description"Finally, the initial stage of oxidation was studied for H2O-exposed Si(100) in the presence of Cl. Following H2O dissociation and saturation of the surface with Cl, a mild anneal allowed oxygen atoms to insert into Si dimer bonds. It was demonstrated that Cl allowed the bridge-bonded oxygen atoms to be imaged as a dark spot in the center of the dimer. The density of these ""split dimer"" defects correlated with the c-type defect density on the clean surface. These results also showed how to produce nearly defect free halogen-terminated Si(100)."
Degree
thesis:*- Name thesis:degree_name
- Ph.D.
- Level thesis:degree_level
- Dissertation
- Discipline thesis:degree_discipline
- Physics
- Grantor
- University of Illinois at Urbana-Champaign
- Year dc:date
- 2015
Author and committee
dc:creator, dc:contributor.*- Author dc:creator
-
- Trenhaile, Brent Reid
- Contributors dc:contributor
-
- Weaver, John H.
Subjects
dc:subject × 1Rights
- Language dc:language
- eng
Identifiers
dc:identifier.*- Identifier
- (MiAaPQ)AAI3250336
- OAI identifier oai:identifier
- oai:www.ideals.illinois.edu:2142/80543