Laser Chemical Vapor Deposition of Titanium Nitride and Process Diagnostics With Laser-Induced Fluorescence Spectroscopy

TiN films have been deposited on Ti-6Al-4V substrates by a cw CO$\sb2$ laser chemical vapor deposition (LCVD) process with TiCl$\sb4$, H$\sb2$, and N$\sb2$. Pulsed dye laser induced fluorescence (LIF) spectroscopy is used to obtain transient gas phase Ti atomic concentration above the substrate. Multi-wavelength pyrometry is applied to measure the surface temperature during deposition. Film thickness profiles are obtained by stylus profilometry, and film compositions are analyzed by Auger Electron Spectroscopy (AES).

Name thesis:degree_name

Ph.D.

Level thesis:degree_level

Dissertation

Discipline thesis:degree_discipline

Mechanical Engineering

Grantor

University of Illinois at Urbana-Champaign

Year dc:date

2014

Author dc:creator

• Chen, Xiangli

Contributors dc:contributor

• Mazumder, Jyoti,

• Engineering, Mechanical
• Physics, Optics
• Engineering, Materials Science

Identifier

(UMI)AAI9503162

OAI identifier oai:identifier

oai:www.ideals.illinois.edu:2142/72242