Photolytic Laser-Induced Chemical Vapor Deposition for Aluminum Film Growth

The mechanisms of UV photodissociation of trimethylaluminum (TMA) and triethylaluminum (TEA) by a KrF (248 nm) pulsed excimer laser were investigated using optical emission spectroscopy, including time-resolved emission measurements. Position-resolved growth rate measurements were used to investigate film growth kinetics during photolysis of TMA using 248 nm light, and deposited films were analyzed using in-situ Auger electron spectroscopy (AES), secondary ion mass spectrometry (SIMS), x-ray diffraction (XRD), scanning electron microscopy, and resistivity measurements.

Name thesis:degree_name

Ph.D.

Level thesis:degree_level

Dissertation

Discipline thesis:degree_discipline

Metallurgical Engineering

Grantor

University of Illinois at Urbana-Champaign

Year dc:date

2014

Author dc:creator

• Gorbatkin, Steven Mark

Contributors dc:contributor

• Greene, J.E.

• Engineering, Materials Science

Identifier

(UMI)AAI8803051

OAI identifier oai:identifier

oai:www.ideals.illinois.edu:2142/71846