Photolytic Laser-Induced Chemical Vapor Deposition for Aluminum Film Growth
The mechanisms of UV photodissociation of trimethylaluminum (TMA) and triethylaluminum (TEA) by a KrF (248 nm) pulsed excimer laser were investigated using optical emission spectroscopy, including time-resolved emission measurements. Position-resolved growth rate measurements were used to investigate film growth kinetics during photolysis of TMA using 248 nm light, and deposited films were analyzed using in-situ Auger electron spectroscopy (AES), secondary ion mass spectrometry (SIMS), x-ray diffraction (XRD), scanning electron microscopy, and resistivity measurements.
University of Illinois - Urbana-Champaign
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University of Illinois at Urbana-Champaign