Photolytic Laser-Induced Chemical Vapor Deposition for Aluminum Film Growth
type: CreativeWork
description: The mechanisms of UV photodissociation of trimethylaluminum (TMA) and triethylaluminum (TEA) by a KrF (248 nm) pulsed excimer laser were investigated using optical emission spectroscopy, including time-resolved emission measurements. Position-resolved growth rate measurements were used to investigate film growth kinetics during photolysis of TMA using 248 nm light, and deposited films were analyzed using in-situ Auger electron spectroscopy (AES), secondary ion mass spectrometry (SIMS), x-ray diffraction (XRD), scanning electron microscopy, and resistivity measurements.
abstract: The mechanisms of UV photodissociation of trimethylaluminum (TMA) and triethylaluminum (TEA) by a KrF (248 nm) pulsed excimer laser were investigated using optical emission spectroscopy, including time-resolved emission measurements. Position-resolved growth rate measurements were used to investigate film growth kinetics during photolysis of TMA using 248 nm light, and deposited films were analyzed using in-situ Auger electron spectroscopy (AES), secondary ion mass spectrometry (SIMS), x-ray diffraction (XRD), scanning electron microscopy, and resistivity measurements.
author: Gorbatkin, Steven Mark
keywords: Engineering, Materials Science
date published: 2014-12-16T20:52:14Z
date modified: 2026-07-22T22:26:05Z
provider: University of Illinois - Urbana-Champaign
publisher: Networked Digital Library of Theses and Dissertations
type: WebPage
source organization: University of Illinois at Urbana-Champaign

PropertyValue
property ID: Handle
value: http://hdl.handle.net/2142/71846