University of Illinois at Urbana-Champaign
Low Energy Ion Bombardment Effects in Supersaturated Copper-Indium Alloys
Abstract
dc:descriptionScanning transmission electron microscopy and Auger electron spectroscopy were used to investigate the effects of low energy (200 - 3000 eV) Ar('+) ion bombardment of supersaturated Cu:In alloys. Ion bombardment always resulted in the preferential sputtering of In although for sample temperatures T(,s) (GREATERTHEQ) 250(DEGREES)C, In loss due to preferential sputtering was increasingly compensated by radiation-assisted surface segregation. Even at room temperature, however, the steady state In concentration in the altered layer during irradiation, while reduced, remained supersaturated and enhanced diffusion to ion bombardment-created point defect sinks resulted in the volume precipitation of randomly dispersed In-rich (delta) phase ((TURN) 30at%In) particles in the near-surface region. Thermally induced precipitates, on the other hand, nucleated only at grain boundaries and were only observed at T(,s) (GREATERTHEQ) 250(DEGREES)C. The average size and number density of radiation-induced precipitates increased with increasing ion bombardment energy E(,i). Upon termination of ion bombardment at T(,s) (GREATERTHEQ) 250(DEGREES)C, the In surface concentration always returned to (TURN) 30at%. The recovery time for this process decreased with increasing T(,s) and E(,i) due to fast diffusion through near-surface regions containing residual damage such as dislocation loops. The measured widths of the compositionally altered layers were on the order of the ion penetration range.
Degree
thesis:*- Name thesis:degree_name
- Ph.D.
- Level thesis:degree_level
- Dissertation
- Discipline thesis:degree_discipline
- Metallurgical Engineering
- Grantor
- University of Illinois at Urbana-Champaign
- Year dc:date
- 2014
Author and committee
dc:creator, dc:contributor.*- Author dc:creator
-
- Rivaud, Lydia
Subjects
dc:subject × 1Identifiers
dc:identifier.*- Identifier
- (UMI)AAI8302971
- OAI identifier oai:identifier
- oai:www.ideals.illinois.edu:2142/71796