The Electronic and Metallurgical Properties of Amorphous Silicon Thin Films Deposited by Rf Sputtering

Mei, Len

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University of Illinois at Urbana-Champaign

The Electronic and Metallurgical Properties of Amorphous Silicon Thin Films Deposited by Rf Sputtering

dc:creator Mei, Len

thesis:degree_name Ph.D.

dc:date2014

Abstract

dc:description

Made available in DSpace on 2014-12-14T16:00:29Z (GMT). No. of bitstreams: 1 7606869.pdf: 5934455 bytes, checksum: 3446e5250f7676f3b661c1f770e0f359 (MD5) Previous issue date: 1975

Degree

thesis:*

Name thesis:degree_name: Ph.D.
Level thesis:degree_level: Dissertation
Discipline thesis:degree_discipline: Metallurgical Engineering
Grantor: University of Illinois at Urbana-Champaign
Year dc:date: 2014

Author and committee

dc:creator, dc:contributor.*

Author dc:creator: Mei, Len

Subjects

dc:subject × 1

Engineering, Metallurgy

Rights

Language dc:language: eng

Identifiers

dc:identifier.*

Identifier: (UMI)AAI7606869
OAI identifier oai:identifier: oai:www.ideals.illinois.edu:2142/68609

Chain of custody

source

Harvested from: University of Illinois - Urbana-Champaign
Base URL: www.ideals.illinois.edu/oai-pmh
Last updated: 2026-07-22
Source record: OAI-PMH GetRecord

related terms

citation

Mei, Len. The Electronic and Metallurgical Properties of Amorphous Silicon Thin Films Deposited by Rf Sputtering. Dissertation thesis, University of Illinois at Urbana-Champaign, 2014. http://hdl.handle.net/2142/68609

The Electronic and Metallurgical Properties of Amorphous Silicon Thin Films Deposited by Rf Sputtering

Abstract

Degree

Author and committee

Subjects

Rights

Identifiers

Chain of custody

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