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University of Illinois at Urbana-Champaign

High-throughput plasma nanomanufacturing and its applications

Abstract

dc:description

Traditional top-down or bottom-up nanomanufacturing processes involve nanoscale pre-patterning, surface-area-sensitive assembly processes or extreme fabrication conditions; therefore, none of them meets the requirements of scalable and translational nanomanufacturing processes in one or more aspects, and thus they all lack industry compatibility. The challenges in nanomanufacturing prevent many nanotechnology innovations from translating into commercial applications. This dissertation presents a low-cost, high-throughput plasma-based nanomanufacturing process, called simultaneous plasma enhanced reactive ion synthesis and etching (SPERISE), to address the technical challenges in mass producing nanoscale structures, components, and devices. This process incorporates and synchronizes top-down reactive ion etching and bottom-up reactive ion synthesis in a single-step nanomanufacturing scheme, allowing a unique lithography-less autonomous creation of one-dimensional nanostructures. As a platform nanomanufacturing technology, the SPERISE process leads to numerous applications, and readily translates many nanoscale devices, such as biosensors, optoelectronic devices, and nanoengineered surfaces, into industrial mass production. To pick a few of these applications, in this dissertation, I demonstrated a high-efficiency black silicon solar cell with nanotextured non-reflective surface, which significantly improved the light-trapping effect of conventional microtextured solar cells by wet chemical processes. Based on the SPERISE nanomanufacturing, a nanostructured plasmonic surface was also created cost-effectively, which exhibits unique physical and chemical properties, such as super light absorption, metal-enhancement fluorescence, surface-enhanced Raman scattering, and superhydrophobicity and “coffee ring” elimination. Furthermore, a plasmonic nanoarray was fabricated with SPERISE process and incorporated in an electrically-stimulated biological microfluidic system to create an electro-optofluidic biosensor for protein kinase sensing and profiling and atomic level nano-bio interface studies. Last, the wafer-scale nanotip array fabricated by the SPERISE process was used as an electrochemical transfer printing mold to enable cost-effective, high-fidelity, high-resolution, and high-throughput printing of 3D metallic nanopatterns, which significantly improved the feasibility of tip-based nanomanufacturing as a next-generation nanolithography technology.

Degree

thesis:*
Name thesis:degree_name
Ph.D.
Level thesis:degree_level
Dissertation
Discipline thesis:degree_discipline
Electrical & Computer Engr
Grantor
University of Illinois at Urbana-Champaign
Year dc:date
2014

Author and committee

dc:creator, dc:contributor.*
Author dc:creator
  • Chen, Yi
Contributors dc:contributor
  • Liu, Gang Logan
  • Cunningham, Brian T.
  • Eden, James G.
  • Hsia, K. Jimmy

Subjects

dc:subject × 19

Rights

dc:rights
Statement dc:rights
  • Copyright 2014 Yi Chen
Language dc:language
en

Identifiers

dc:identifier.*
Handle dc:identifier
http://hdl.handle.net/2142/49793
OAI identifier oai:identifier
oai:www.ideals.illinois.edu:2142/49793

Chain of custody

source
Harvested from
University of Illinois - Urbana-Champaign
Base URL
www.ideals.illinois.edu/oai-pmh
Last updated
2026-07-22
Source record
OAI-PMH GetRecord
citation

Chen, Yi. High-throughput plasma nanomanufacturing and its applications. Dissertation thesis, University of Illinois at Urbana-Champaign, 2014. http://hdl.handle.net/2142/49793